Pockels Cell Arrays for Polarization Control in Microlithography

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Solution Overview

Problem

Microlithographic projection exposure apparatuses face challenges in flexibly setting different polarization distributions without the need for mirror arrangements with independently settable mirror elements.

Innovation Solution

An optical system comprising a polarization-influencing optical arrangement with transverse Pockels cells or Kerr cells, arranged in arrays successively in the light propagation direction, allowing for flexible polarization state settings, including combinations with diffractive optical elements to achieve arbitrary intensity and polarization distributions in the pupil plane.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If mirror arrangements with independently settable mirror elements are used to set polarization distributions, then flexibility in setting different polarization states is improved, but device complexity increases

Engineering Contradiction:
Improveflexibility in setting polarization distributionsVSAvoidcomplexity of mirror arrangement
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent replaces the mechanical mirror arrangement system with an optical system using Pockels cells and diffractive optical elements. The Pockels cells use electro-optic effects to modulate polarization states through electric fields, eliminating the need for mechanically adjustable mirror elements while achieving the same flexibility in setting polarization distributions.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention changes the control parameter from mechanical mirror angles to electric field parameters applied to Pockels cells. By varying the electric field strength and orientation in the Pockels cells, different polarization states are achieved without mechanical movement, thereby reducing device complexity while maintaining adaptability.

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If mirror arrangements are used for polarization setting, then polarization control capability is improved, but intensity loss and ray shading effects increase

Engineering Contradiction:
Improvepolarization control capabilityVSAvoidintensity loss and ray shading
Core Design Contradiction:
Adaptability or versatilityVSLoss of energy

Solution Approach 1:

The patent substitutes mechanical mirror-based polarization control with an electro-optic system using Pockels cells. This substitution eliminates ray shading effects caused by mirror structures and reduces intensity loss by using transparent electro-optic materials that do not block or shade light paths.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention introduces Pockels cells as intermediary elements that interact with light through electro-optic effects rather than mechanical reflection. These cells act as transparent mediators that modify polarization states without the physical obstruction and shading inherent in mirror arrangements, thereby preserving light intensity.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Device complexity

If Pockels cells are used instead of mirror arrangements, then device complexity is reduced, but manufacturing precision requirements increase

Engineering Contradiction:
Improvecomplexity of polarization control systemVSAvoidprecision of Pockels cell alignment
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent divides the polarization control function into separate modular Pockels cells, each responsible for specific polarization modulation tasks. This segmentation allows for standardized manufacturing of individual cells with precise specifications, making the overall system easier to manufacture and assemble while maintaining high precision through modular design.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention specifies precise manufacturing parameters for Pockels cells including crystal orientation, electrode positioning, and cell dimensions. By establishing well-defined parameter specifications during manufacturing, the system achieves the required precision through controlled production parameters rather than complex post-assembly adjustments.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables flexible and selectable polarization distributions in the pupil plane, reducing the need for mirror arrangements and minimizing intensity loss and ray shading effects, while allowing for efficient polarization switching and conversion between different polarization states.

Implementation Method 1

the first and second polarization-influencing elements are transverse Pockels cells

Methodology Applied
Scientific EffectPockels effect: Pockels Effect

Implementation Method 2

the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field

Methodology Applied
Scientific Effectbirefringence: Birefringence

Implementation Method 3

the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells or transverse Kerr cells

Methodology Applied
Scientific EffectKerr effect: Kerr Effect

Data Source

PatentUS9442385B2Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
Publication Date: 2016.09.13 CARL ZEISS SMT GMBH
  • US9442385B2 patent drawing
  • US9442385B2 patent drawing
  • US9442385B2 patent drawing

AI summary

The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises at least one first array of first polarization-influencing elements and a second array of second polarization-influencing elements, wherein the first and second arrays are arranged successively in the light propogation direction, wherein the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field, and wherein the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells.