Point Diffraction Interferometer Single Spherical Wave Design
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Solution Overview
Problem
Current point diffraction interferometric wavefront aberration measuring devices are complex, costly, and have low light use efficiency due to the need for generating two standard spherical waves, which increases system complexity and sensitivity to vibrations, and requires precise alignment and high precision, making it difficult to achieve high-quality wavefront aberration measurements in optical systems.
Innovation Solution
A device that generates only one standard spherical wave output on the object plane of the measured optical system, using an optical source, splitter, light intensity and polarization regulators, a phase shifter, and an ideal wavefront and point light source generator, with an image wavefront detection unit comprising a photoelectric sensor and image mask, to reduce system complexity and increase light use efficiency, while maintaining high precision detection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If two standard spherical waves are generated on the object plane to achieve high interference visibility and eliminate system errors, then measurement precision is improved, but device complexity increases and light use efficiency decreases
Solution Approach 1:
The patent extracts and eliminates one of the two standard spherical wave generation paths, retaining only the essential path needed for measurement. This reduces system complexity while maintaining measurement precision through the single standard spherical wave approach combined with appropriate reference standards.
Solution Approach 2:
The single standard spherical wave path is designed to serve multiple functions: it provides the reference wave for interference, enables wavefront aberration measurement, and maintains system simplicity. The optical components are configured to achieve multiple measurement objectives through one primary path.
2Measurement precision
If two standard spherical waves are generated via keyhole components to achieve high interference visibility, then measurement precision is improved, but alignment difficulty increases and light use efficiency decreases
Solution Approach 1:
The patent removes one of the two keyhole component paths, eliminating the associated alignment complexity. The single standard spherical wave path requires significantly fewer alignment adjustments while maintaining sufficient interference visibility for accurate wavefront aberration measurement.
3Measurement precision
If standard spherical waves are regenerated via filtering circular hole on image mask to maintain measurement accuracy, then measurement precision is improved, but light output efficiency decreases and detection repeatability worsens
Solution Approach 1:
The patent eliminates the need to regenerate standard spherical waves through the filtering circular hole process. By using a single standard spherical wave path with appropriate optical components, the system achieves measurement accuracy without the light loss and time delay associated with wave regeneration and filtering.
4Measurement precision
If exposure time is increased to obtain sufficiently clear interferograms to maintain measurement precision, then measurement precision is improved, but sensitivity to vibration and disturbance increases and frame speed decreases
Solution Approach 1:
The patent removes one of the two standard spherical wave paths, which simplifies the interferogram formation process. This reduction in system complexity leads to faster frame rates and reduced sensitivity to vibration, while maintaining interferogram clarity through optimized optical components and detection parameters.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces system complexity and precision requirements, increases light use efficiency, and enhances the accuracy of wavefront aberration detection, achieving high precision measurements with reduced sensitivity to vibrations and improved repeatability.
Implementation Method 1
an optical source, an optical splitter
Implementation Method 2
a phase shifter
Implementation Method 3
a photoelectric sensor, and a support, with the image mask comprising a transmittance band and a filtering circular hole, the photoelectric sensor comprising a two-dimensional detector
Implementation Method 4
an ideal wavefront and point light source generator, which is an optical component transforming a light inputted from a first input port thereof to a standard spherical wave in a scope of an object numerical aperture
Data Source
AI summary
A device for measuring point diffraction interferometric wavefront aberration having an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. A method for detecting wavefront aberration of the optical system by using the device is also disclosed.