Polarization Analysis Apparatus Dual Aperture Adjustment

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Solution Overview

Problem

Conventional polarization analysis apparatuses using a single aperture are limited in their application across various fields due to varying measurement sensitivity based on the sample's properties, making them inefficient for measuring different types of semiconductor samples.

Innovation Solution

A polarization analysis apparatus utilizing two apertures, where the first aperture adjusts the angle of incidence and numerical aperture of a lighting beam through rotary or linear operations, and the second aperture further adjusts the beam's parameters to enhance measurement sensitivity, allowing for more versatile applications.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a single aperture is used to measure sample properties, then the device structure is simple, but the measurement precision deteriorates for samples with varying properties

Engineering Contradiction:
Improvemeasurement precisionVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The single aperture is divided into multiple apertures (first aperture and second aperture) with different sizes. Each aperture is designed to measure specific sample properties within certain ranges, enabling precise measurement across varying sample thicknesses and materials by selecting the appropriate aperture.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The measurement device is designed with multiple apertures that can handle various sample types (different thicknesses and materials) using a single integrated system. The device universally measures different sample properties by switching between apertures based on the sample characteristics.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Adaptability or versatility

If one aperture is used for all measurements, then the device is easy to operate, but the adaptability to various sample properties deteriorates

Engineering Contradiction:
ImproveadaptabilityVSAvoidease of operation
Core Design Contradiction:
Adaptability or versatilityVSEase of operation

Solution Approach 1:

The aperture selection mechanism is designed to dynamically switch between different apertures based on sample properties. The system automatically or manually selects the appropriate aperture (first or second) according to the sample thickness and material type, enabling adaptive measurement without complex manual configuration.

Inventive Principle:
Principle #15Dynamics

3Measurement precision

If a single aperture measures all sample properties, then the device complexity is low, but the measurement accuracy for varying sample thicknesses and materials deteriorates

Engineering Contradiction:
Improvemeasurement accuracyVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The measurement system segments the aperture into multiple components (first aperture and second aperture) with different sizes optimized for different sample ranges. This segmentation allows each aperture to provide high measurement accuracy for its designated sample type while maintaining overall system simplicity through modular design.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS12066331B2Polarization analysis apparatus and method for adjusting angle of incidence or numerical aperture using aperture
Publication Date: 2024.08.20 AUROS TECH INC
  • US12066331B2 patent drawing
  • US12066331B2 patent drawing
  • US12066331B2 patent drawing

AI summary

There is provided a polarization analysis apparatus that adjusts an angle of incidence or a numerical aperture by using an aperture. The apparatus includes: a first aperture that transmits a lighting beam reflected from a sample on a substrate; a second aperture that transmits a lighting beam having passed through the first aperture; and a detector that detects a lighting beam having passed through the second aperture and selects an angle of incidence of the lighting beam and numerical apertures of the first aperture and the second aperture.