Wire Grid Polarizer Ion Doping for Precise Etching and Polarization
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Solution Overview
Problem
Existing display devices, particularly head-mounted displays, face challenges in achieving high-resolution images due to limitations in polarizer technology, which affect the transmittance and polarization degree, necessitating improved wire grid polarizers for enhanced performance.
Innovation Solution
A display device incorporating a wire grid polarizer with a stacked insulating and grid pattern containing doped ions, specifically boron, where ion concentrations vary between the patterns, and a method of manufacturing this polarizer through sequential etching processes to ensure uniform pitch and width, enhancing etching selectivity and process margin.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional polarizer technology is used, then manufacturing is simpler, but transmittance and polarization degree are insufficient for high-resolution displays
Solution Approach 1:
The wire grid polarizer is segmented into multiple thin metal layers (first, second, and third metal layers) with different orientations. Each layer is patterned separately through sequential etching processes, allowing precise control of polarization properties while maintaining manufacturability through modular construction
Solution Approach 2:
The patent transitions from a single-plane polarizer structure to a multi-layer three-dimensional structure. The metal layers are stacked at different orientations (0 degrees, 45 degrees, and 90 degrees) to achieve enhanced polarization degree and transmittance characteristics required for high-resolution head-mounted displays
2Manufacturing precision
If ion doping is applied to improve etching selectivity, then manufacturing precision improves, but process complexity increases
Solution Approach 1:
Ion doping is performed as a preliminary action before the sequential etching processes. The metal layers are doped with ions to modify their etch resistance, ensuring that each layer can be selectively removed in the correct sequence. This preliminary modification enables precise control of the multi-step etching process
Solution Approach 2:
The patent modifies the physical and chemical parameters of the metal layers through ion doping. By changing the doping concentration and type, the etching selectivity between different metal layers is optimized, allowing the sequential etching process to achieve the required manufacturing precision for the wire grid polarizer structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution results in a wire grid polarizer with improved transmittance and polarization degree, enabling high-quality images suitable for high-resolution applications, such as head-mounted displays.
Implementation Method 1
performing an ion doping process on the target substrate
Data Source
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AI summary
A display device and a method of manufacturing the same are provided. The display device comprises a substrate, a display element layer disposed on the substrate, and comprising a first electrode, a light-emitting layer, and a second electrode, a phase retardation layer disposed on the display element layer, and a wire grid polarizer disposed on the phase retardation layer, and comprising a wire grid pattern in which an insulating pattern and a grid pattern are stacked, wherein the insulating pattern and the grid pattern contain doped ions.