Polishing Composition Processing to Reduce Cellulose Micro-Aggregation

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Solution Overview

Problem

Polishing compositions containing cellulose derivatives for semiconductor substrates face challenges in accurately suppressing micro aggregation, leading to surface defects such as light point defects non-cleanable (LPD-N), which conventional methods fail to adequately address.

Innovation Solution

A method of producing a polishing composition and substrate protective agent involving the steps of dissolving a cellulose derivative in a solvent, heating the solution, and adding a surfactant at elevated temperatures to reduce the number and size of coarse particles, thereby minimizing surface defects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a cellulose derivative is used as a water-soluble polymer in polishing composition, then protection and wettability of the surface are improved, but micro aggregation occurs causing surface defects

Engineering Contradiction:
Improvesurface protection and wettabilityVSAvoidsurface defects from micro aggregation
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the molecular weight parameter of the cellulose derivative from conventional ranges to a specific range (weight-average molecular weight: 50,000 to 500,000). This parameter change reduces micro aggregation while maintaining the protective and wetting functions, thereby resolving the contradiction between surface protection and surface defect prevention

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite system by combining the cellulose derivative with specific additives (polymer compound and surfactant) in controlled proportions. This composite approach enhances surface protection while the synergistic interaction prevents micro aggregation, resolving the contradiction between improved surface properties and defect reduction

Inventive Principle:
Principle #40Composite materials

2Productivity

If conventional polishing composition methods are used, then basic polishing function is achieved, but post-polishing surface defects like LPD-N cannot be sufficiently reduced

Engineering Contradiction:
Improvepolishing functionVSAvoidsurface quality with LPD-N defects
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent modifies multiple parameters including molecular weight of cellulose derivative, concentrations of polymer compounds (0.01-5 wt%) and surfactants (0.001-1 wt%), and processing temperature (40-100°C). These parameter changes maintain efficient polishing while dramatically reducing post-polishing surface defects, achieving both productivity and manufacturing precision

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent introduces polymer compounds and surfactants as intermediary substances that mediate between the cellulose derivative and the substrate surface. These intermediaries prevent direct harmful interactions causing LPD-N defects while maintaining the polishing function, thus resolving the contradiction between productivity and surface quality

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively reduces post-polishing surface defects like LPD-N by attenuating molecular aggregation and entanglement of cellulose derivatives, resulting in a high-quality polished surface.

Implementation Method 1

micro aggregation potentially causing a surface defect

Methodology Applied
Scientific EffectMolecular aggregation: Coagulation

Implementation Method 2

molecular aggregation and entanglement of cellulose derivatives

Methodology Applied
Scientific EffectMolecular entanglement:

Implementation Method 3

heating the material cellulose derivative solution

Methodology Applied
Scientific EffectThermal energy input: Heating

Implementation Method 4

adding a material surfactant to the material cellulose derivative solution

Methodology Applied
Scientific EffectSurfactant action: Surfactant

Data Source

PatentUS20260103621A1Method of producing polishing composition and polishing composition
Publication Date: 2026.04.16 FUJIMI INCORPORATED

AI summary

In terms of composition containing a cellulose derivative, provided are a polishing composition, a substrate protective agent, and a method of producing the same that are effective for reducing post-polishing surface defects. Provided is a method of producing a polishing composition containing an abrasive, a basic compound, a cellulose derivative, and a surfactant. The method includes a step (A) of dissolving a material cellulose derivative in a solvent to prepare a material cellulose derivative solution; and the following steps: a step (B1) of heating the material cellulose derivative solution and a step (B2) of adding a material surfactant to the material cellulose derivative solution that underwent the step (B1); or a step (C1) of adding a material surfactant to the material cellulose derivative solution to prepare an additive mixture liquid and a step (C2) of heating the additive mixture liquid.