Polishing Solution Distribution via Universal Joint and Radial Flow
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Solution Overview
Problem
Existing polishing solution distribution methods face challenges in ensuring even distribution and preventing particle solidification due to inadequate leveling and inclination variations, as well as high costs and complexity in existing systems.
Innovation Solution
A polishing solution distribution apparatus featuring a branch body with a universal joint mechanism supported above its gravity center, radially connected flow passages, and a flexible supply system that maintains a leveled posture and prevents stagnant flow, ensuring even distribution and reducing particle solidification.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a separate valve type with plural branch piping is used to distribute polishing solution, then flow quantity of respective branch piping can be adjusted, but the adjustment operation becomes troublesome and cost increases due to multiple valves and complex piping
Solution Approach 1:
The distribution system is segmented into multiple radial flow passages within a single integrated distribution member, allowing independent flow control to different branches without requiring separate external valves for each branch. The segmentation occurs within the unified structure of the distribution member itself.
Solution Approach 2:
Multiple flow control functions that would traditionally require separate valves and piping systems are merged into a single distribution member with radial flow passages. This consolidation reduces the number of components, simplifies the overall piping system, and decreases adjustment operations while maintaining the ability to control flow to multiple branches.
2Ease of operation
If polishing solution is distributed using conventional methods, then distribution can be achieved, but distribution deviation increases when leveling for distributor installation is insufficient or inclination varies
Solution Approach 1:
The radial flow passages are designed to maintain equipotential flow conditions by distributing solution along radial paths from the center. This geometric configuration ensures that flow distribution remains uniform regardless of installation inclination or leveling variations, as the radial symmetry compensates for gravitational effects.
Solution Approach 2:
The distribution member utilizes asymmetric radial flow passages that are optimized for flow distribution in one primary direction, making the system less sensitive to inclination in perpendicular directions. This asymmetric design within the radial configuration provides directional tolerance to installation variations.
3Device complexity
If polishing solution flows through stagnant areas, then distribution is simplified, but particles contained in polishing solution solidify due to stagnant flow
Solution Approach 1:
The flow passages are designed to create periodic flow patterns that prevent stagnant conditions. The radial configuration combined with delivery ports positioned lower than connection points creates continuous flow motion that periodically refreshes the solution, preventing particle settlement and solidification while maintaining system simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves reduced deviation in polishing solution distribution, improved processing accuracy, and cost-effectiveness by maintaining a consistent leveled posture and preventing particle solidification, thus enhancing workpiece polishing quality and reducing maintenance needs.
Implementation Method 1
a universal joint mechanism to support the branch body via the support portion at a position being higher than the gravity center of the branch body
Implementation Method 2
adjusting flow quantity of the polishing solution with buoyancy force of the sphere body
Data Source
AI summary
The present invention provides a polishing solution distribution apparatus capable of reducing distribution deviation of polishing solution even when leveling for installation is insufficient or inclination of an installation location varies and a polishing apparatus having the same. The polishing solution distribution apparatus includes a cone-shaped branch body in which a solution pan to store supplied polishing solution is formed and in which plural flow passages radially connected to a side face of the solution pan respectively and having a delivery port to supply polishing solution to a position lower than the connected position are formed, a support portion to support the branch body, and a universal joint mechanism to support the branch body via the support portion at a position being higher than the gravity center of the branch body.


