Polishing Force Feedback Control for Uniform Workpiece Finishing
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Solution Overview
Problem
Current polishing methods for workpieces lack the ability to adjust the force between the polishing head and the workpiece in real time, leading to uneven polishing and reduced quality and efficiency.
Innovation Solution
A polishing apparatus with a sensor to monitor the polishing force and a movement compensation assembly to adjust the position of the workpiece relative to the polishing assembly, maintaining the force within a preset range to ensure uniform polishing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the polishing head rotates or vibrates relative to the workpiece for polishing operation, then the polishing process can be performed, but the force between the polishing head and the workpiece cannot be adjusted in real time, resulting in uneven polishing effects
Solution Approach 1:
The patent introduces a sensor to detect the force between the polishing head and the workpiece in real time, and a controller to adjust the polishing head's position based on this feedback, creating a closed-loop control system that maintains uniform polishing force throughout the process
Solution Approach 2:
The patent makes the polishing head's position adjustable and dynamic by introducing a movement compensation assembly that can modify the distance between the polishing head and workpiece surface during polishing, allowing real-time adaptation to maintain optimal polishing force
2Ease of operation
If the force between the polishing head and the workpiece is not adjusted in real time, then the polishing process is simple to operate, but it results in poor polishing and reduced production efficiency
Solution Approach 1:
The patent implements self-service by allowing the system to automatically detect and adjust the polishing force through the sensor and controller, eliminating the need for manual intervention while maintaining optimal polishing conditions and improving production efficiency
Data Source
AI summary
A polishing apparatus includes a polishing device, a polishing fixing device, and a controller. The polishing fixing device includes a rotating mechanism, a sensor, a movement compensation assembly, a first moving assembly and a second moving assembly. The sensor in the polishing fixing device senses pressure applied to the workpiece during polishing, the movement compensation assembly can drive the rotating mechanism to move in compensation, so as to keep the polishing pressure within a certain range for uniformity in polishing, improving the polishing quality and production efficiency of the workpiece.