Polishing Head Zonal Agent Transport via Centrifugal Holes
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing polishing heads for optical spectacle surfaces face challenges in effectively transporting polishing agents between the polishing film and the surface being processed, leading to inefficient polishing and potential lifting of the polishing film during the process.
Innovation Solution
The polishing head incorporates additional holes and grooves in the polishing film and carrier part, designed to utilize centrifugal forces for efficient distribution of polishing agents, with features like angled wall surfaces and channels to enhance agent transport and prevent lifting, ensuring consistent delivery to the polishing area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single central hole is used in the polishing film for agent transport, then the structure is simple, but the transport efficiency and distribution uniformity are insufficient
Solution Approach 1:
The single central hole is segmented into multiple holes arranged radially. The polishing film includes a first hole at the center and a second hole at a radial distance, creating multiple discharge paths for polishing agent. This segmentation increases transport efficiency and distribution uniformity while maintaining structural simplicity.
Solution Approach 2:
The hole arrangement transitions from a one-dimensional central point to a two-dimensional radial distribution. By positioning holes at different radial distances from the rotation axis, the system utilizes radial dimensionality to improve agent distribution across the polishing surface.
2Adaptability or versatility
If the polishing film is made flexible to conform to the surface, then it adapts well to the workpiece, but it may lift off during high-speed rotation
Solution Approach 1:
The polishing film is pre-formed with a specific curvature radius that matches the expected workpiece surface. This preliminary shaping ensures the film conforms to the surface geometry before rotation, preventing lift-off during high-speed operation while maintaining flexibility for surface adaptation.
Solution Approach 2:
The film's geometric parameters, specifically its curvature radius, are optimized to balance flexibility and stability. By controlling the curvature radius within a specific range relative to the workpiece radius, the film maintains stable contact during rotation without excessive lifting.
3Strength
If the carrier part is made rigid to maintain structure, then it provides good support, but it cannot effectively utilize centrifugal forces for agent transport
Solution Approach 1:
The carrier part is designed with differentiated local properties: the region containing the holes is made flexible to utilize centrifugal forces for agent transport, while other regions maintain rigidity for structural support. This local quality differentiation allows the carrier to simultaneously provide support and enable efficient agent distribution through centrifugal action.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design improves the transport of polishing agents, maintaining consistent contact between the polishing film and the surface, enhancing the polishing process by ensuring effective distribution and preventing film lift-off, thereby improving polishing quality and reproducibility.
Implementation Method 1
designed to utilize centrifugal forces for efficient distribution of polishing agents
Implementation Method 2
channels to enhance agent transport
Data Source
Figure 1~2
Figure 3~4
Figure 5a~5d
AI summary
The invention relates to a polishing head 1 for spectacle surfaces 8.1 with a base body 2 for attachment to a polishing spindle 7, with an elastic support part 3 for an attached or attachable polishing foil 4, wherein the support part 3 has a recess 3.1 with a wall surface 3.2 and a depth t, and the polishing foil 4 has at least one hole 4.1, wherein the hole 4.1 forms an access to the recess 3.1, wherein the polishing foil 4 has, in addition to the hole 4.1, at least one further hole 4.4, which is arranged in the region of an edge 3.3 of the recess 3.1 and has a radial distance a from the hole 4.1, wherein the further hole 4.4 forms an outflow channel for polishing medium from the recess 3.1, or the wall surface 3.2 is angled at an angle α at least over a part of the depth t and/or with respect to a circumference, at least segmentally, relative to the axis of rotation D. and/or the support part 3 has at least one in the front face 3.The invention includes a groove 3.5 with a groove base 3.6 and a depth t1, which adjoins the recess 3.1, and/or the support part 3 has at least one channel 3.7 with an opening 3.7a connecting the recess 3.1 and the end face 3.3. The invention also relates to a method in which a supply of polishing compound is filled into the recess 3.1 in the support part 3 before the polishing head 1 and the surface 8.1 to be polished are brought together.