Polishing Pad Curved Surface Following

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Solution Overview

Problem

Polishing pads currently have limitations in effectively following curved surfaces, leading to suboptimal surface finish and efficiency in polishing curved faces.

Innovation Solution

A polishing pad with a polishing layer and a support layer, where the support layer is softer than the polishing layer and has a hardness of 30 to 70 F hardness, allowing for improved deformation and contact with curved surfaces, enhancing the pad's ability to follow and polish curved faces.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If the support layer is made softer to improve following performance on curved surfaces, then the ability to follow curved faces is improved, but the structural stability and support function deteriorates

Engineering Contradiction:

Improvefollowing performance on curved surfacesVSAvoidstructural stability

Core Design Contradiction:

Adaptability or versatilityVSStability of the object's composition

Solution Approach 1:

The patent applies parameter changes by specifying a precise hardness range (30-70 F hardness) for the support layer. This quantitative parameter optimization allows the support layer to be soft enough to follow curved surfaces effectively while maintaining sufficient structural stability to support the polishing layer and transmit polishing forces uniformly.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent employs composite materials by combining the support layer with the polishing layer in a two-layer structure. The support layer (softer material) and polishing layer (harder material) work together synergistically, where the support layer provides curvature adaptation while the polishing layer maintains structural integrity and performs the actual polishing function.

Inventive Principle:

Principle #40Composite materials

2Strength

If the support layer hardness is increased to improve structural support, then the support function is improved, but the ability to follow curved surfaces deteriorates

Engineering Contradiction:

Improvesupport functionVSAvoidability to follow curved surfaces

Core Design Contradiction:

StrengthVSAdaptability or versatility

Solution Approach 1:

The patent resolves this contradiction by establishing an optimal hardness parameter range (30-70 F hardness) for the support layer. This parameter optimization ensures the support layer is sufficiently soft to conform to curved surfaces while maintaining adequate structural support capability, avoiding both extremes of too soft or too hard.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent applies local quality by creating a differentiated two-layer structure where each layer has optimized properties for its specific function. The support layer has lower hardness optimized for curvature following, while the polishing layer has higher hardness optimized for structural support and polishing action, with each layer's properties tailored to its local requirements.

Inventive Principle:

Principle #3Local quality

3Ease of manufacture

If the polishing pad structure is simplified to reduce manufacturing complexity, then the ease of manufacture is improved, but the polishing performance on curved surfaces deteriorates

Engineering Contradiction:

Improvemanufacturing simplicityVSAvoidpolishing performance on curved surfaces

Core Design Contradiction:

Ease of manufactureVSAdaptability or versatility

Solution Approach 1:

The patent applies segmentation by dividing the polishing pad into two distinct functional layers: a support layer and a polishing layer. This segmentation allows each layer to be optimized independently for its specific function while maintaining relatively simple manufacturing processes for each layer, balancing manufacturing ease with enhanced curved surface performance.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The patent uses composite materials to achieve enhanced performance without excessive manufacturing complexity. The two-layer composite structure combines materials with different hardness properties, where the manufacturing process for each layer can be independently optimized, resulting in a composite structure that delivers superior curved surface following capability.

Inventive Principle:

Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The polishing pad achieves a higher performance in following curved surfaces, reducing waviness and improving the surface finish by ensuring a larger contact area and reduced pressure on edges, thus enhancing polishing efficiency and preventing scratches.

Implementation Method 1

the support layer is softer than the polishing layer and is fixed to a face opposite to the polishing face of the polishing layer, and the support layer has a hardness of not less than 30 and less than 70 in terms of F hardness

Methodology Applied

Scientific EffectElastic deformation: Elasticity

Data Source

PatentUS20240227119A9Polishing pad and polishing method

Publication Date: 2024.07.11 FUJIMI INCORPORATED

AI summary

Provided is a polishing pad having a high following performance even when a surface to be polished is a curved face. A polishing pad (1) in an embodiment of the present invention includes a polishing layer (2) having a polishing face (21) and a support layer (3) that is formed from a material softer than the polishing layer (2) and is fixed to a face (22) opposite to the polishing face (21) of the polishing layer (2). The support layer (3) has a hardness of not less than 30 and less than 70 in terms of F hardness.