Poly(alkylene oxide) Ligands for Quantum Dot Dispersion in Photoresists
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Solution Overview
Problem
Quantum dots are poorly miscible with hydrophilic photoresists and UV-curable resins due to their hydrophobic long alkyl ligands, leading to inefficient dispersion and loss of photoluminescence when processed in air, which hinders the production of high-performance quantum dot films for color conversion layers.
Innovation Solution
The use of poly(alkylene oxide) ligands with specific functional groups bound to the surface of nanostructures, such as quantum dots, to enhance their dispersion in hydrophilic photoresists and UV-curable formulations, allowing for improved optical properties and stability in film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If quantum dots with hydrophobic long alkyl ligands are used, then they are soluble in apolar organic solvents, but they are immiscible with hydrophilic photoresists and UV-curable formulations
Solution Approach 1:
The patent changes the chemical parameters of the ligands by replacing hydrophobic long alkyl ligands with hydrophilic short alkyl ligands terminated by functional groups such as carboxylic acid, amine, or hydroxyl. This parameter change enables quantum dots to be miscible with hydrophilic photoresists and UV-curable formulations while maintaining colloidal stability
Solution Approach 2:
The patent creates composite ligand structures combining short alkyl chains with polar functional groups. These composite ligands provide both the solubility characteristics needed for hydrophilic formulations and the colloidal stability required for maintaining quantum dot dispersion, effectively bridging the incompatibility between hydrophobic quantum dots and hydrophilic photoresists
2Ease of manufacture
If quantum dots are processed in air conditions, then they can be deposited and patterned with photoresists, but they lose photoluminescence
Solution Approach 1:
The patent changes the surface chemistry parameters of quantum dots by introducing hydrophilic functional groups that form protective shells around the nanocrystals. This parameter change allows quantum dots to withstand air exposure, developer solutions, and UV curing conditions without losing photoluminescence, enabling standard photolithography processing
Solution Approach 2:
The patent applies hydrophilic ligand shells as a protective cushion before quantum dots are exposed to harsh processing conditions. This beforehand protection layer prevents direct contact between the sensitive nanocrystal core and harmful environmental factors such as oxygen, moisture, and developer chemicals, thereby preserving photoluminescence during air-based processing
3Productivity
If high quantum dots loading is used to make efficient color filter, then blue light blocking is improved, but dispersion in photoresists becomes more difficult
Solution Approach 1:
The patent changes the surface polarity parameters of quantum dots by equipping them with hydrophilic functional groups. This parameter change enables high concentration quantum dot dispersions to remain stable in hydrophilic photoresists, allowing efficient color filters with high quantum dot loading to be manufactured without aggregation or precipitation issues
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The poly(alkylene oxide) ligands facilitate stable and efficient dispersion of quantum dots in photoresists and UV-curable formulations, maintaining photoluminescence and enabling the production of high-quality quantum dot films with enhanced optical properties.
Implementation Method 1
poly(alkylene oxide) ligands with specific functional groups bound to the surface of nanostructures
Implementation Method 2
functional group terminated poly(alkylene oxide)... FG is —OH, —SH, —NH2, —C(═O)OH
Implementation Method 3
enhance their dispersion in hydrophilic photoresists and UV-curable formulations
Implementation Method 4
monomeric or oligomeric acrylates or epoxies that can be polymerized upon exposure to UV radiation
Implementation Method 5
quantum dots are known to lose photoluminescence when processed in air... maintains photoluminescence
Data Source
AI summary
The present disclosure provides nanostructure compositions and methods of producing nanostructure compositions. The nanostructure compositions comprise at least one population of nanostructures, at least one poly(alkylene oxide) ligand bound to the surface of the nanostructures, and optionally at least one organic resin. The present disclosure also provides nanostructure films comprising a nanostructure layer and methods of making nanostructure films.