Polygon Laser Ablation for Optical Defect Isolation
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Solution Overview
Problem
Optical devices, such as electrochromic windows, often suffer from defects like electrical short circuits that are visually discernible and aesthetically unappealing, which existing methods struggle to effectively mitigate without causing further shorting or leaving noticeable pinholes.
Innovation Solution
The method involves forming a laser ablation perimeter around defects in optical devices using a controlled laser process, where the fluence level is adjusted to ensure uniform energy distribution and minimize excess energy, allowing for the isolation of defects without creating additional shorting issues, and employing a polygon ablation pattern to adapt to various defect shapes, reducing the deactivated area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a laser ablation perimeter is formed around defects in optical devices, then defects are isolated and visual impact is reduced, but excess energy may cause additional shorting or damage
Solution Approach 1:
The laser fluence is dynamically adjusted during the ablation process. The system starts with a low fluence level and progressively increases it to the target level over multiple passes, allowing controlled material removal without excessive energy deposition that could cause shorting or damage to surrounding areas.
Solution Approach 2:
The laser ablation process performs preliminary action by first establishing a perimeter at low fluence levels before increasing energy. This preliminary low-energy pass creates initial isolation without the harmful effects of high excess energy, preparing the structure for subsequent controlled ablation passes.
2Reliability
If conventional circular ablation patterns are used, then defects are circumscribed, but larger deactivated areas are created than necessary
Solution Approach 1:
The ablation pattern is segmented into multiple straight line passes that collectively form a closed perimeter around the defect. This segmentation allows the laser to follow the actual defect contour more closely rather than creating a large circular buffer zone, reducing the total deactivated area while maintaining effective defect isolation.
Solution Approach 2:
The ablation perimeter is tailored to match the local geometry of the defect rather than applying a uniform circular pattern. The polygonal path adapts to the defect's shape, creating a tight-fitting perimeter that minimizes the deactivated area while ensuring complete circumscription of the defect region.
3Reliability
If laser fluence is increased to ensure complete defect isolation, then defect mitigation is improved, but risk of creating additional shorting increases
Solution Approach 1:
The laser fluence is dynamically adjusted during the ablation process. The system starts with a low fluence level and progressively increases it to the target level over multiple passes, allowing controlled material removal without excessive energy deposition that could cause shorting or damage to surrounding areas.
Solution Approach 2:
The laser ablation process performs preliminary action by first establishing a perimeter at low fluence levels before increasing energy. This preliminary low-energy pass creates initial isolation without the harmful effects of high excess energy, preparing the structure for subsequent controlled ablation passes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively isolates defects, reducing their visual impact by converting halos into smaller pinholes and minimizing further shorting risks, while allowing for precise control over the ablation process to maintain device functionality and appearance.
Implementation Method 1
forming a laser ablation perimeter surrounding a defect in an optical device
Data Source
AI summary
Methods of determining a polygon ablation pattern for use in mitigating one or more defects in an optical device are described. A method comprises identifying spatial coordinates of one or more defects areas in a first image of the optical device taken when tinted, defining a region of interest around at least one defect area of the one or more defect areas, and determining a polygon boundary around the at least one defect area in the region of interest to define the polygon ablation pattern.


