Polygonal Mask Data Simplification for Precise Exposure Patterns
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Solution Overview
Problem
Conventional methods for simplifying mask information to reduce data size often compromise the precision of exposure patterns, leading to degraded photomask performance, as they prioritize human vision-based simplification over geometric accuracy.
Innovation Solution
A mask information adjusting apparatus that acquires and removes vertices or sides of mask patterns based on the influence of their removal on exposure patterns, using area-based criteria to ensure minimal impact on pattern precision during data size reduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If mask patterns are approximated to polygons with high precision to maintain exposure pattern accuracy, then manufacturing precision is improved, but data size increases
Solution Approach 1:
The patent changes the parameter of polygon vertex count to control data size while maintaining exposure pattern precision. By dynamically adjusting the number of vertices based on pattern importance and removing unnecessary vertices, the system achieves optimal balance between precision and data size reduction.
Solution Approach 2:
The patent extracts and removes unnecessary vertices from polygonal mask patterns. By identifying and eliminating vertices that do not significantly contribute to exposure pattern accuracy, the system reduces data size while preserving essential pattern information.
2Productivity
If the number of vertices in mask patterns is reduced to decrease data size, then productivity is improved, but manufacturing precision deteriorates
Solution Approach 1:
The patent dynamically adjusts the number of vertices parameter based on pattern characteristics and exposure requirements. By optimizing this parameter, the system achieves high productivity through reduced data size while maintaining manufacturing precision through intelligent vertex selection and removal.
Solution Approach 2:
The patent applies partial simplification rather than complete vertex removal. By selectively removing only the most insignificant vertices and retaining others that maintain exposure accuracy, the system achieves productivity improvement without excessive loss of precision.
3Productivity
If conventional simplification algorithms are used to reduce data size, then productivity is improved, but manufacturing precision deteriorates
Solution Approach 1:
The patent incorporates feedback mechanisms that evaluate the impact of vertex removal on exposure patterns. By continuously assessing pattern accuracy and adjusting simplification accordingly, the system achieves both high productivity and maintained precision, overcoming the limitations of conventional algorithms.
Solution Approach 2:
The patent applies different simplification strategies to different regions of the mask pattern based on their importance. By treating critical and non-critical areas differently, the system maintains precision in essential regions while aggressively simplifying less important areas to improve overall productivity.
Data Source
AI summary
In order to solve a problem of conventional mask information adjusting apparatuses in which the data size of mask information that can produce precise exposure patterns is large, an mask information adjusting apparatus includes: a subject information acquiring unit that acquires pre-adjustment mask information containing a polygonal mask pattern; a processing unit that acquires the degree of influence of removal of each vertex or side of the mask pattern, on an exposure pattern that is generated using a photomask corresponding to the mask pattern, in association with the vertex or point, and simplifies the mask pattern by removing each vertex or side according to whether or not a predetermined condition regarding the acquired degree of influence is satisfied; and an output unit that outputs post-adjustment mask information containing the mask pattern that has been simplified by the processing unit.