Polyimide Display Base Layer for Narrow-Bezel Contact Holes
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Solution Overview
Problem
The existing methods for manufacturing large-screen display devices with tiled displays face challenges in reducing bezel width, particularly when using glass substrates, as forming contact holes is time-consuming and decreases yield due to process difficulties.
Innovation Solution
A display device structure with a base layer comprising a first and second polyimide layer, an etch stop layer of amorphous silicon, and doping areas, where contact holes are formed efficiently using dry etching and laser processes, allowing for electrical connection of lines and pads, thereby reducing the non-display area and improving manufacturing yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If contact holes are formed in a glass substrate base layer, then electrical connection between signal lines and driving circuit is achieved, but the manufacturing time increases and yield decreases due to process difficulties
Solution Approach 1:
The patent changes the material parameter of the base layer from glass substrate to polyimide layer, which fundamentally alters the etching characteristics and enables more efficient contact hole formation processes with better yield
Solution Approach 2:
The patent employs a composite base layer structure consisting of multiple polyimide layers with different properties (first and second polyimide layers), combining the advantages of each layer to achieve both manufacturability and performance
2Reliability
If contact holes are formed in a glass substrate base layer, then electrical connection between signal lines and driving circuit is achieved, but the manufacturing time increases due to process difficulties
Solution Approach 1:
The patent changes the material parameter of the base layer from glass substrate to polyimide layer, which fundamentally alters the etching characteristics and enables more efficient contact hole formation processes with shorter manufacturing time
Solution Approach 2:
The patent replaces the mechanical drilling or laser drilling process typically used for glass substrates with a chemical etching process using etch stop layer, which is significantly faster and more efficient for forming contact holes
3Area of stationary object
If bezel width is reduced by forming contact holes in display area, then display quality of tiled display is improved, but manufacturing complexity increases due to process difficulties
Solution Approach 1:
The patent changes the material parameter of the base layer to polyimide, which simplifies the contact hole formation process and reduces manufacturing complexity while enabling bezelless display design
Solution Approach 2:
The patent introduces an etch stop layer as an intermediary element that facilitates the contact hole formation process, making it easier to control and execute while achieving the desired electrical connections
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the efficient formation of contact holes in the display device, reducing the bezel width and improving the yield of large-screen display devices, allowing for a more natural and seamless image display across multiple screens.
Implementation Method 1
contact holes are formed efficiently using dry etching and laser processes
Implementation Method 2
contact holes are formed efficiently using dry etching and laser processes
Implementation Method 3
the etch stop layer may include doping areas at an area where the second lines and the pads overlap with each other
Data Source
AI summary
A display device includes: a base layer including a first surface, and a second surface; a plurality of pixels on the first surface; and a plurality of first lines on the first surface. The base layer includes: a first base layer; an etch stop layer on the first base layer; a plurality of second lines on the etch stop layer; and a second base layer on the etch stop layer and the second lines. The first base layer, the etch stop layer, the second lines, and the second base layer are sequentially stacked, and the first lines are electrically connected to the second lines through first contact holes.