Polyimide Electrode Patterning Layer for Organic FETs
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Solution Overview
Problem
Conventional methods for forming electrode patterns in electronic devices, such as masking vapor deposition and photolithography, are cumbersome and difficult to scale, and existing patterning layers do not provide sufficient durability or electrical insulation for organic FET devices.
Innovation Solution
A polyamic acid or polyimide layer with specific structural units, irradiated with ultraviolet light to create a differential wettability pattern, allowing for precise electrode formation without the need for additional additives, and serving as both a patterning layer and gate insulating film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional masking vapor deposition or photolithography is used for electrode patterning, then the process can form electrode patterns, but the process becomes cumbersome and difficult to scale
Solution Approach 1:
The invention extracts and eliminates the gate insulating film formation step from the conventional multi-step process. The patterning layer is designed to simultaneously serve as both patterning medium and gate insulating film, removing the need for a separate gate insulating film deposition step while maintaining all necessary functions.
Solution Approach 2:
The invention merges the patterning layer and gate insulating film into a single integrated layer. This multi-functional layer combines the patterning function (through differential wettability) with the gate insulating function, thereby simplifying the overall device structure and manufacturing process.
2Reliability
If conventional patterning layers are used, then electrode patterns can be formed, but the patterning layer lacks sufficient durability and electrical insulation for organic FET devices
Solution Approach 1:
The patterning layer is designed to perform multiple functions simultaneously: it serves as the patterning medium (through UV-induced wettability differences), as the gate insulating film (providing electrical insulation), and as a durable structural layer (providing mechanical strength). This multi-functionality eliminates the need for separate layers and ensures all necessary performance requirements are met.
Solution Approach 2:
The invention utilizes parameter changes in the patterning layer material properties through UV irradiation. The layer transitions from a state of uniform wettability to a state of differential wettability (hydrophilic vs. hydrophobic regions) upon UV exposure, enabling precise patterning while maintaining the material's inherent durability and insulating properties.
3Manufacturing precision
If a patterning layer is present in the final device, then electrode patterning is achieved, but the patterning layer may adversely affect device properties
Solution Approach 1:
The invention extracts the harmful effect by eliminating the need for a separate gate insulating film, thereby removing the interface between two separate layers that could potentially create defects or performance issues. The integrated structure reduces the number of interfaces and potential failure points.
Solution Approach 2:
The UV irradiation induces a controlled parameter change in the patterning layer, creating permanent wettability differences that enable precise patterning. This parameter change occurs only in the surface properties of the layer, leaving the bulk material properties (durability, insulation) unchanged and beneficial for device performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables finer patterning, simplifies the production process, and provides high electrical insulation, allowing for the use of the patterning layer as both an electrode and gate insulating layer in organic FET devices, improving reliability and reducing production complexity.
Implementation Method 1
a polyimide obtainable by cyclodehydration of such a polyamic acid
Implementation Method 2
by subjecting it to exposure to ultraviolet ray, a polyamic acid having a specific structure or a polyimide obtainable by cyclodehydration of such a polyamic acid, will function as an electrode patterning layer
Implementation Method 3
utilizing the difference in wettability with a liquid to the patterning of a functional thin film. This is a method wherein a patterning layer comprising a region wettable with a liquid and a region hardly wettable with a liquid
Data Source
AI summary
Provided is an electrode patterning layer used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. The electrode patterning layer is prepared by irradiating a layer comprising a polyamic acid having repeating units at the formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape:wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.