Polyimide RDL Dielectric for Filling Molding Pits in PoP Packaging

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Solution Overview

Problem

The semiconductor industry faces challenges in achieving high integration density and efficient packaging of semiconductor dies due to limitations in current packaging techniques, particularly in Package-on-Package (PoP) technology, where molding pits can induce defects and reduce production yield.

Innovation Solution

The use of a polyimide dielectric material with specific solvents, cross-linkers, and photosensitizers in a polymer material for forming redistribution layers (RDLs) in semiconductor packages, which fills molding pits and reduces RDL bridging, thereby enhancing packaging efficiency and yield.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional packaging techniques are used, then manufacturing process is simple, but molding pits induce defects and reduce production yield

Engineering Contradiction:
Improveproduction yieldVSAvoidmolding pit defects
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent converts the harmful molding pits into beneficial features by filling them with conductive material to form via holes that provide electrical interconnections. This transforms the defects into functional elements of the packaging structure, eliminating yield loss while maintaining process simplicity

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent introduces an intermediary material (conductive paste or electroplated material) that fills the molding pits and creates via holes. This intermediary serves as both a defect filler and an electrical connection pathway, resolving the conflict between maintaining simple packaging processes and achieving high reliability

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If RDL features are formed with conventional materials, then manufacturing is easier, but resolution of RDL features is lower

Engineering Contradiction:
ImproveRDL feature resolutionVSAvoidRDL formation process
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent changes the material parameters of the RDL formation process by using low-viscosity conductive paste and controlling the drying/curing parameters. This enables higher resolution features to be formed while maintaining ease of manufacture through screen printing or dispensing techniques

Inventive Principle:
Principle #35Parameter changes

3Reliability

If high curing temperature is used, then polymer material cures completely, but thermal budget increases and causes yield loss

Engineering Contradiction:
Improvedevice reliabilityVSAvoidcuring temperature
Core Design Contradiction:
ReliabilityVSTemperature

Solution Approach 1:

The patent utilizes phase transition of the polymer material by selecting materials that cure at low temperatures through controlled chemical reactions. The polymer precursor undergoes a phase transition from liquid to solid at temperatures below 150°C, achieving complete curing without thermal damage to sensitive devices

Inventive Principle:
Principle #36Phase transitions

Solution Approach 2:

The patent changes the chemical composition parameters of the polymer material to enable low-temperature curing. By selecting specific polymer precursors and additives, the curing temperature is reduced from conventional high temperatures to below 150°C, eliminating thermal budget issues while ensuring complete curing and high device reliability

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves the resolution of RDL features, reduces curing temperature, and lowers thermal budget, resulting in increased production throughput and device reliability by minimizing yield loss from defects such as broken RDL lines.

Implementation Method 1

The polymer material includes a polymer precursor, a photosensitizer, and a solvent; patterning the polymer material; and curing the polymer material

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Implementation Method 2

which fills molding pits and reduces RDL bridging

Methodology Applied
Scientific EffectCapillary action: Capillary Action

Data Source

PatentUS12147159B2Semiconductor device and method of manufacture
Publication Date: 2024.11.19 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12147159B2 patent drawing
  • US12147159B2 patent drawing
  • US12147159B2 patent drawing

AI summary

A method of manufacturing a semiconductor device includes forming a polymer mixture over a substrate, curing the polymer mixture to form a polymer material, and patterning the polymer material. The polymer mixture includes a polymer precursor, a photosensitizer, a cross-linker, and a solvent. The polymer precursor may be a polyamic acid ester. The cross-linker may be tetraethylene glycol dimethacrylate. The photosensitizer includes 4-phenyl-2-(piperazin-1-yl)thiazole. The mixture may further include an additive.