Polyimide Film Vaporizer Pressure Control
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Solution Overview
Problem
The existing film forming apparatus for polyimide films faces challenges in maintaining uniformity of film thickness and quality due to variations in the supply ratio of PMDA and ODA gases, which are affected by changes in internal pressure of the vaporizers, leading to inconsistent film formation.
Innovation Solution
A film forming apparatus with adjustable internal pressure vaporizers for PMDA and ODA, coupled with pressure measurement units and a controller to calculate and regulate the supply amounts of the gases, ensuring uniform supply and maintaining consistent film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the internal pressure of the vaporizers is not controlled, then the apparatus structure is simple, but the supply ratio of PMDA and ODA gases becomes uneven, degrading film uniformity
Solution Approach 1:
Pressure measurement units continuously monitor the internal pressure of each vaporizer, and the controller adjusts the vaporizer operations based on this feedback to maintain uniform supply ratio of PMDA and ODA gases, ensuring consistent film uniformity
Solution Approach 2:
The internal pressure of each vaporizer is used as a controllable parameter to regulate the supply amount of each monomer gas, allowing precise control of the supply ratio to achieve uniform film deposition
2Manufacturing precision
If the supply amount of PMDA gas and ODA gas is not uniformly controlled, then the film formation rate increases, but the film thickness uniformity and quality deteriorate
Solution Approach 1:
The supply amount of each monomer gas is controlled by adjusting the internal pressure parameter of its corresponding vaporizer, enabling precise regulation of film formation rate while maintaining uniform film thickness and quality
3Manufacturing precision
If pressure measurement units and control mechanisms are added, then the supply ratio control improves, but the device complexity increases
Solution Approach 1:
Pressure measurement units provide real-time pressure data from each vaporizer to the controller, which automatically adjusts vaporizer operations to maintain uniform supply ratio, achieving precise control with minimal manual intervention
Solution Approach 2:
The system uses its own pressure measurement data to automatically regulate its operation, with the controller adjusting vaporizer parameters based on measured pressure values to maintain optimal supply ratio without external control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures stable and uniform polyimide film formation by precisely controlling the supply of PMDA and ODA gases, enhancing film quality and consistency.
Implementation Method 1
a first vaporizer (21) installed such that an internal pressure thereof can be adjustable, and vaporizing a first raw material in a solid state, and supplying the vaporized first raw material gas to the substrate; wherein the first raw material comprises an aromatic acid dianhydride
Implementation Method 2
a second vaporizer (41) installed such that an internal pressure thereof can be adjustable, and vaporizing a second raw material in a liquid state, and supplying the vaporized second raw material gas to the substrate; wherein the second raw material comprises an aromatic diamine
Implementation Method 3
a monomer of PMDA and a monomer of ODA are required to be polymerized on the surface of the substrate
Data Source
AI summary
A film forming apparatus for forming a polyimide film on a substrate installed within a film forming container. The apparatus includes: a first vaporizer configured to vaporize a first raw material in a solid state, and supply the vaporized first raw material gas to the substrate; a second vaporizer configured to vaporize a second raw material in a liquid state, and supply the vaporized second raw material gas to the substrate; a first pressure measurement unit configured to measure the internal pressure of the first vaporizer; a second pressure measurement unit configured to measure the internal pressure of the second vaporizer; and a controller configured to calculate a supply amount of the first and second raw material gases by the first and second pressure measurement units, respectively, and control the first and second vaporizers to supply the first and second raw material gases in a uniform amount.