Polymer-Bound Acid Generator for EUV Resist LWR Reduction
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Solution Overview
Problem
As the pattern feature size in microelectronic devices decreases, the line width roughness (LWR) and critical dimension uniformity (CDU) of resist materials become significant challenges due to the segregation or agglomeration of base polymers and acid generators, and the diffusion of generated acid, leading to a tradeoff between sensitivity and LWR/CDU.
Innovation Solution
A resist composition is developed using a polymer-bound acid generator with a sulfonium or iodonium salt structure having an iodized arylsulfonic acid anion attached to the polymer backbone, which enhances sensitivity, reduces LWR, and improves CDU by controlling acid diffusion and increasing EUV absorption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the acid diffusion distance is reduced to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The patent introduces a polymer-bound acid generator as an intermediary structure that anchors the acid generation function to the polymer backbone. This mediator structure allows acid to be generated in situ with controlled diffusion, resolving the contradiction between reducing acid diffusion (for better LWR/CDU) and maintaining sensitivity. The polymer backbone acts as a spatial organizer that mediates between the need for localized acid generation and sufficient sensitivity.
Solution Approach 2:
The patent changes the parameter of acid generator structure from small molecule to polymer-bound structure. This parameter change fundamentally alters the diffusion characteristics while maintaining acid generation efficiency. The polymer-bound structure provides a different spatial and temporal profile for acid release, simultaneously improving LWR/CDU and maintaining sensitivity.
2Manufacturing precision
If the PEB temperature is lowered to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The patent changes the parameter of post-exposure bake temperature to lower values while achieving improved LWR and CDU. The polymer-bound acid generator enables effective acid generation and control at reduced temperatures, eliminating the need for high PEB temperatures that compromise sensitivity. This parameter change in processing conditions is made possible by the innovative acid generator structure.
3Manufacturing precision
If the amount of quencher added is increased to improve LWR or CDU, then sensitivity becomes lower
Solution Approach 1:
The polymer-bound acid generator structure acts as an intermediary that provides spatial control over acid generation, reducing the need for additional quencher to control acid diffusion. The polymer backbone itself provides a structural framework that limits acid diffusion pathways, thereby reducing the dependency on quencher additives and maintaining sensitivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high sensitivity, reduced LWR, and improved CDU, maintaining these performance metrics across both positive and negative tone pattern formations, thereby addressing the tradeoff issues in existing technologies.
Implementation Method 1
highly EUV absorptive iodine is included, the efficiency of decomposition of the acid generator during exposure is increased
Implementation Method 2
the diffusion of generated acid
Data Source
AI summary
A resist composition comprising a base polymer possessing a sulfonium or iodonium salt structure having an iodized arylsulfonic acid anion attached to its backbone is provided. It exhibits a high sensitivity and forms a pattern with reduced LWR or improved CDU independent of whether it is of positive or negative type.