Polymer-Bound Resist Composition for Low-Diffusion Fine Patterning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resist materials face challenges in achieving high sensitivity, low line width roughness (LWR), and critical dimension uniformity (CDU) due to acid diffusion, which affects the resolution and dissolution contrast of fine patterns in microelectronic device manufacturing.
Innovation Solution
A resist composition comprising a base polymer with repeat units having a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation with an aromatic group-containing cyclic secondary or tertiary ester type acid labile group, acting as a polymer-bound acid generator, enhances sensitivity and reduces acid diffusion, leading to improved LWR and CDU.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If acid diffusion is suppressed by reducing temperature and/or time of post-exposure bake, then resolution is improved, but sensitivity and dissolution contrast are drastically reduced
Solution Approach 1:
The patent changes the chemical parameters of the acid generator by using a polymer-bound acid generator with specific molecular weight and structure. This modifies the acid diffusion characteristics without requiring extreme temperature or time reductions, thereby maintaining both resolution and sensitivity
Solution Approach 2:
The patent employs a composite resist composition combining polymer-bound acid generator with specific base polymers and additives. This composite structure enables controlled acid diffusion while preserving dissolution contrast and sensitivity through synergistic interactions between components
2Manufacturing precision
If acid diffusion is suppressed to improve resolution, then line width roughness is reduced, but sensitivity declines
Solution Approach 1:
The patent modifies the acid generator parameters by using polymer-bound structures with controlled molecular weights (100-10,000 Da). This enables suppressed acid diffusion for reduced LWR while the polymer structure maintains sufficient sensitivity through controlled acid release
Solution Approach 2:
The polymer backbone acts as an intermediary between the acid generation and diffusion processes. It provides a controlled environment for acid release, mediating between the need for low diffusion (smooth LWR) and adequate sensitivity
3Productivity
If conventional acid generators are used to maintain sensitivity, then acid diffusion increases, but resolution and dissolution contrast deteriorate
Solution Approach 1:
The patent creates a composite system where polymer-bound acid generator works synergistically with specific base polymers. This composite enables both high sensitivity through efficient acid generation and high dissolution contrast through controlled acid distribution
Solution Approach 2:
The patent implements local quality control by having the acid generator bound to specific polymer structures. This creates localized acid generation zones that maintain high contrast while the overall polymer structure controls diffusion to preserve sensitivity
4Length of moving object
If feature size is reduced to increase integration density, then manufacturing capability improves, but acid diffusion effects worsen resolution
Solution Approach 1:
The patent changes the fundamental parameters of acid generation by using polymer-bound structures. This enables resolution enhancement for sub-45nm features by controlling acid diffusion at the molecular level, allowing continued miniaturization
Solution Approach 2:
The patent segments the acid generation function by binding it to polymer structures rather than using free acid generators. This segmentation enables precise spatial control of acid diffusion, critical for maintaining resolution at reduced feature sizes
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition exhibits reduced acid diffusion, high contrast, and low swell, resulting in improved LWR, CDU, and resolution with a wide process margin, suitable for forming fine patterns in microelectronic devices.
Implementation Method 1
incorporating a polymer-bound acid generator comprising repeat units (a) having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation
Implementation Method 2
a base polymer of polarity switch type capable of generating a phenol or carboxy group through acid-catalyzed deprotection reaction
Implementation Method 3
The positive pattern is formed at a higher resolution because the alkaline development provides a higher dissolution contrast
Data Source
AI summary
A resist composition comprising a base polymer comprising repeat units having a salt structure consisting of a sulfonic acid anion bonded to a polymer backbone and a sulfonium cation having an acid labile group of aromatic group-containing cyclic secondary or tertiary ester type as the acid generator exhibits a high sensitivity and reduced LWR or improved CDU.