Polymer Crystal EUV Reticle for Dynamic OPC
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Solution Overview
Problem
Current EUV lithography processes require expensive and time-consuming redesign of photomasks due to optical proximity correction (OPC) issues and the need for multiple masks, leading to high costs and inefficiencies in semiconductor manufacturing.
Innovation Solution
A polymer crystal-based photomask with independently controlled pixel units that can adjust their orientation in response to EUV light, allowing for real-time optimization of OPC and pattern generation without the need for extensive mask redesign or multiple masks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional multilayer silicon and molybdenum photomasks are used for EUV lithography, then the pattern transfer capability is achieved, but the cost and time for redesign and manufacturing new masks becomes very high when OPC optimization is needed
Solution Approach 1:
The photomask employs liquid crystal material that can dynamically change its optical properties in response to applied voltage. This allows the mask pattern to be reconfigured electronically without physical redesign or remanufacturing, enabling rapid OPC optimization and adaptation to different lithography requirements.
Solution Approach 2:
The invention changes the physical state of the photomask material from fixed (traditional multilayer) to variable (liquid crystal). By controlling the orientation of liquid crystal molecules through voltage application, the optical parameters of the mask can be adjusted to optimize pattern transfer for different OPC requirements and lithography conditions.
2Manufacturing precision
If traditional photomasks are used, then the initial pattern generation is achieved, but multiple expensive masks are needed for different patterns and OPC optimizations
Solution Approach 1:
The liquid crystal-based photomask can perform multiple functions by changing its pattern configuration through voltage control. A single mask device can generate different patterns and accommodate various OPC requirements, replacing the need for multiple specialized masks while maintaining high pattern generation capability.
Solution Approach 2:
The dynamic reconfigurability of the liquid crystal material allows one photomask to serve multiple purposes across different lithography steps and OPC optimizations, reducing the total number of masks needed in the manufacturing process.
3Ease of manufacture
If fixed photomask designs are used, then manufacturing simplicity is maintained, but adaptability to different OPC requirements and lithography conditions is limited
Solution Approach 1:
The photomask transitions from a static, fixed design to a dynamic, reconfigurable system. The liquid crystal material can be electrically controlled to adapt its optical properties, providing versatility for different OPC and lithography conditions while maintaining ease of manufacture through a single mask design that accommodates all requirements.
Solution Approach 2:
The single photomask design incorporates universal adaptability through liquid crystal technology, allowing it to function effectively across various OPC scenarios and lithography conditions without requiring multiple specialized mask designs or complex manufacturing processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables rapid prototyping and reduced costs by allowing for in-situ adjustment of photomask patterns, optimizing OPC and reducing the need for multiple masks, thereby streamlining the semiconductor manufacturing process.
Implementation Method 1
at least one polymer crystal element configured to interact with extreme ultraviolet (EUV) light based on an orientation of the polymer crystal element
Implementation Method 2
a plurality of electrodes configured to control the orientation of the polymer crystal element by applying voltage across the polymer crystal element
Data Source
AI summary
Embodiments of the present disclosure relate to a photomask. The photomask may include: a substrate; and one or more pixel units formed over the substrate. Each pixel unit may include: at least one polymer crystal element configured to interact with extreme ultraviolet (EUV) light based on an orientation of the polymer crystal element; and a plurality of electrodes configured to control the orientation of the polymer crystal element by applying voltage across the polymer crystal element. Each pixel unit is controlled by the respective plurality of electrodes independently, and the one or more pixel units generate a pattern for lithography upon exposure to the EUV light.