Polymer Film Substrate Processing to Reduce HPM Consumption
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Solution Overview
Problem
Existing substrate processing methods using HPM liquid to remove metal foreign matter from substrates result in high liquid usage and environmental burden, and there is a need for a more efficient and environmentally friendly method.
Innovation Solution
A substrate processing method involving a polymer-containing liquid that forms a polymer film on the substrate surface to adsorb metal foreign matter, followed by rinsing, reducing the need for continuous liquid immersion and minimizing liquid usage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a tank filled with HPM liquid is used to immerse the substrate, then metal foreign matter can be removed from the substrate, but a large amount of HPM liquid is consumed and environmental burden increases
Solution Approach 1:
The patent applies this principle by forming a thin polymer film on the substrate surface that contains acidic polymer for removing metal foreign matter. This film acts as a localized treatment layer, eliminating the need for immersing the substrate in large quantities of HPM liquid while maintaining effective metal removal capability.
Solution Approach 2:
The patent applies this principle by concentrating the metal foreign matter removal function into a localized polymer film on the substrate surface. The acidic polymer within the film provides targeted treatment only where needed, rather than requiring uniform immersion in bulk HPM liquid throughout the entire substrate area.
2Reliability
If HPM liquid is used for substrate processing, then metal foreign matter is removed, but environmental burden increases due to liquid waste
Solution Approach 1:
The patent applies this principle by forming a thin polymer film on the substrate surface that contains acidic polymer for removing metal foreign matter. This film acts as a localized treatment layer, eliminating the need for immersing the substrate in large quantities of HPM liquid while maintaining effective metal removal capability.
Solution Approach 2:
The patent applies this principle by enabling the polymer film to be removed together with adsorbed metal foreign matter in a single rinsing operation. This combined removal reduces waste handling complexity and environmental burden compared to dealing with large volumes of contaminated HPM liquid.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively removes metal foreign matter from substrates with reduced liquid consumption, thereby minimizing environmental impact and improving yield.
Implementation Method 1
By an action of the acidic polymer in the polymer film, a metal foreign matter is pulled away from the major surface of the substrate and adsorbed by the polymer film
Implementation Method 2
rotating the substrate with the polymer-containing liquid adhered to the major surface to spreadingly coat the polymer-containing liquid and form a polymer film
Implementation Method 3
supplying, to the major surface of the substrate, a rinse liquid that cleans the major surface of the substrate in a state in which the polymer film is formed on the major surface
Data Source
AI summary
A substrate processing method includes a polymer-containing liquid supplying step of supplying, to a major surface of a substrate, a polymer-containing liquid that contains an acidic polymer and a solvent dissolving the acidic polymer, a polymer film forming step of rotating the substrate with the polymer-containing liquid adhered to the major surface to spreadingly coat the polymer-containing liquid and form a polymer film, containing the acidic polymer, on the major surface of the substrate, and a rinsing step of supplying, to the major surface of the substrate, a rinse liquid that cleans the major surface of the substrate in a state in which the polymer film is formed on the major surface.