Polymer-Grafted Nanoparticles for Uniform Monolayer Self-Assembly

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Solution Overview

Problem

Nanoparticle lithography faces challenges such as particle aggregation, difficulty in forming uniform monolayers, lack of control during self-assembly, and inability to transfer patterns to other materials, limiting its application in data storage systems.

Innovation Solution

The development of polymer-grafted and oligomer-grafted nanoparticles that self-assemble into uniform monolayers on substrates, using topographic and chemical guiding patterns to control ordering and facilitate pattern transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If nanoparticles are used for self-assembly, then pattern formation is enabled, but particle aggregation occurs due to strong interactions between particles

Engineering Contradiction:
Improvepattern formation qualityVSAvoidparticle aggregation
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent introduces polymeric and oligomeric ligands as intermediary substances that mediate between nanoparticles and the substrate. These ligands bind to nanoparticle surfaces and provide controlled interactions with the substrate, preventing direct strong particle-particle interactions that cause aggregation while enabling有序 self-assembly into uniform monolayers with precise pattern formation.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If conventional self-assembly methods are used, then nanoparticle monolayers can be formed, but uniform monolayers are difficult to achieve

Engineering Contradiction:
Improvemonolayer uniformityVSAvoidself-assembly control
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent changes the chemical and physical parameters of the self-assembly system by introducing specifically engineered polymeric and oligomeric ligands with controlled molecular weights, functional groups, and chain lengths. These parameter changes enable precise control over nanoparticle-substrate interactions, facilitating the formation of uniform monolayers with high ordering and minimal defects.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates composite structures combining nanoparticles with polymeric/oligomeric ligands and substrate materials. This composite approach allows the ligands to serve multiple functions: binding to nanoparticle surfaces, mediating substrate interactions, and providing steric control during self-assembly, thereby achieving uniform monolayer formation that is difficult to obtain with simple nanoparticle systems.

Inventive Principle:
Principle #40Composite materials

3Productivity

If fast drying steps are used during self-assembly, then processing time is reduced, but entropic crystallization limits control

Engineering Contradiction:
Improveprocessing speedVSAvoidself-assembly control
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The polymeric and oligomeric ligands act as intermediaries that control the drying and crystallization process. Their molecular structure and interaction with the substrate enable controlled slow assembly during drying, preventing rapid entropic crystallization while maintaining high processing speed. The ligands mediate between the need for fast processing and the requirement for controlled self-assembly, achieving both speed and precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

4Adaptability or versatility

If ligands are removed from nanoparticles, then pattern transfer is enabled, but pattern quality is affected

Engineering Contradiction:
Improvepattern transfer capabilityVSAvoidpattern quality
Core Design Contradiction:
Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The polymeric and oligomeric ligands serve as removable intermediaries that facilitate pattern transfer. They can be selectively removed after enabling controlled self-assembly and pattern formation, allowing the nanoparticle monolayer pattern to be transferred to the substrate without compromising pattern quality. The ligands mediate between the self-assembly process and the final pattern transfer, enabling both adaptability and precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the formation of densely packed, uniform nanoparticle monolayers with controlled ordering, suitable for large-scale applications in magnetic data storage systems, improving pattern quality and transferability.

Implementation Method 1

each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles

Methodology Applied
Scientific EffectChemical bonding: Chemical Bonding

Implementation Method 2

self-assembled nanoparticles grafted to polymeric and/or oligomeric ligands

Methodology Applied
Scientific EffectSelf-assembly: Self-Assembly

Data Source

PatentUS9966096B2Self-assembled nanoparticles with polymeric and/or oligomeric ligands
Publication Date: 2018.05.08 WESTERN DIGITAL TECHNOLOGIES INC
  • US9966096B2 patent drawing
  • US9966096B2 patent drawing
  • US9966096B2 patent drawing

AI summary

In one embodiment, a structure includes: a substrate; and a monolayer of nanoparticles positioned above the substrate, where the nanoparticles are each grafted to one or more oligomers and/or polymers, and where each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles. In another embodiment, a structure includes: a substrate; a structured layer positioned above the substrate, the structured layer comprising a plurality of nucleation regions and a plurality of non-nucleation regions; and a crystalline layer positioned above the structured layer, where the plurality of nucleation regions have a pitch in a range between about 5 nm to about 20 nm.