Conductive Polymer Composition for Electron Beam Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conductive polymer compositions used in lithography, particularly with electron beams, face issues such as electrification phenomena and adverse effects on chemically amplified resists due to acid diffusion and hydrophobicity, leading to changes in resist shape and sensitivity.
Innovation Solution
A conductive polymer composition comprising a polyaniline-based conductive polymer, a polyanion, and an amino acid, which suppresses acid diffusion and enhances antistatic performance without affecting the resist, allowing for high-resolution patterning in electron beam lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an aqueous antistatic agent is used on chemically amplified resist, then antistatic effect is achieved, but the hydrophobic resist surface prevents proper application and mixing layers form causing resist shape changes
Solution Approach 1:
The patent changes the chemical composition parameters of the antistatic agent by incorporating a specific polyaniline derivative with controlled acidity and molecular weight, along with a polyanion and amino acid, to achieve both antistatic effect and compatibility with hydrophobic resist surfaces without forming harmful mixing layers
Solution Approach 2:
The patent uses a composite material system consisting of polyaniline derivative, polyanion, and amino acid together, where the polyanion and amino acid components modify the surface interaction properties to enable proper application on hydrophobic resist while maintaining antistatic functionality
2Reliability
If antistatic film is applied on electron beam resist, then electrification is prevented, but acid diffusion from the film alters resist sensitivity and pattern shape
Solution Approach 1:
The patent controls the acidity parameter of the antistatic film by selecting specific polyaniline derivatives with controlled substitution patterns and combining them with polyanions and amino acids, reducing acid diffusion to levels that do not alter resist sensitivity while maintaining sufficient antistatic effect
Solution Approach 2:
The patent creates a composition where different components serve localized functions: the polyaniline derivative provides antistatic effect, the polyanion controls acidity and film formation, and the amino acid further modulates acid diffusion, achieving local optimization of properties to prevent both electrification and pattern distortion
3Reliability
If polyaniline-based conductive polymer with polyacid is used, then antistatic performance is achieved, but high acidity causes neutralization of exposure acid and resist insolubilization
Solution Approach 1:
The patent changes the acidity parameter by replacing strong polyacid with a polyanion and amino acid system that provides lower acidity, preventing neutralization of exposure acid while maintaining antistatic performance through the conductive polyaniline derivative
Solution Approach 2:
The patent extracts the harmful high acidity property from the antistatic composition by removing the polyacid component and replacing it with a milder polyanion-amino acid system, retaining only the necessary antistatic functionality through the polyaniline derivative
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition provides excellent antistatic performance, maintaining resist sensitivity and resolution over time, preventing electrification and ensuring high-quality resist patterns without altering the resist's shape or sensitivity.
Implementation Method 1
the shape or the sensitivity of the resist may change. For example, an acid produced by exposure is neutralized by a component in the antistatic film
Implementation Method 2
This is a phenomenon that when a substrate to be irradiated with electron beam is coated with an insulating resist film, it is charged by accumulation of electric charge on or in the resist film
Data Source
AI summary
The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid,wherein RA1 to RA4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and RA1 and RA2, or RA3 and RA4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, dose not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.