Patterned Polymer Masks for Precise Phosphor Layering in pcLEDs
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Solution Overview
Problem
Current methods for phosphor deposition in pcLEDs lack precision and efficiency, particularly in preventing light leakage between adjacent pixels, which affects the color temperature and rendering properties of the emitted light.
Innovation Solution
A method using a patterned polymer film as a mask to selectively block or allow phosphor deposition on pcLEDs, allowing for the subsequent removal of deposited phosphor from masked areas, thereby controlling phosphor distribution and reducing cross-talk between pixels.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional phosphor deposition methods are used, then phosphor material can be applied to LED surfaces, but the deposition lacks precision causing light leakage between adjacent pixels
Solution Approach 1:
The patent divides the deposition process into controlled segments by using patterned masks that define specific deposition zones for each pixel. This segmentation prevents phosphor material from spreading into adjacent pixel areas, thereby eliminating light leakage while maintaining precise phosphor placement within each pixel boundary.
Solution Approach 2:
The patent introduces patterned masks as intermediary elements between the phosphor deposition source and the LED array. These masks act as mediators that selectively allow phosphor material to reach only the intended pixel areas while blocking deposition in inter-pixel regions, thus preventing light leakage without compromising the phosphor application process.
2Illumination intensity
If phosphor concentration is increased to improve color rendering, then color accuracy improves, but light absorption increases reducing LED light output
Solution Approach 1:
The patent applies different phosphor concentrations and compositions to different spatial locations within each pixel area using patterned deposition masks. This allows optimization of color rendering in specific regions while maintaining higher light transmission in other regions, thereby balancing color accuracy with light output efficiency.
Solution Approach 2:
The patent varies phosphor layer parameters such as thickness, concentration, and composition across different pixel areas through controlled deposition. By adjusting these parameters locally, the system optimizes the balance between color rendering performance and light absorption losses for each specific application requirement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise and efficient phosphor deposition, enhancing the color accuracy and reducing light leakage between pcLED pixels, improving the overall performance of pcLED arrays in various applications such as displays and adaptive illumination systems.
Implementation Method 1
using a patterned polymer (e.g., latex) film as a mask to block phosphor deposition
Implementation Method 2
The phosphor films may be deposited by sedimentation or electrophoretic deposition (EPD) of phosphor grains (particles)
Implementation Method 3
The phosphor films may be deposited by sedimentation or electrophoretic deposition (EPD) of phosphor grains (particles)
Data Source
AI summary
A method for depositing patterned phosphor films comprises using a patterned polymer film as a mask to block phosphor deposition, or allow subsequent removal of deposited phosphor, from selected areas of a device surface covered by the polymer film. The method generally comprises disposing the patterned polymer film mask on the device, subsequently depositing the phosphor, and then removing the mask and any phosphor deposited on the mask from the device. The polymer film may be deposited in the desired mask pattern or patterned after deposition.