Polyrotaxane Urethane Resin Polishing Pad Abrasion Resistance
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Solution Overview
Problem
Conventional urethane resins used in polishing pads lack high abrasion resistance and scratch resistance, which limits their effectiveness in polishing semiconductor materials, requiring a material with improved mechanical properties and elastic recovery for stable high-speed polishing.
Innovation Solution
A urethane resin is developed by polymerizing a polymerizable composition comprising a polyrotaxane with a specific structure and a polyiso(thio)cyanate compound, creating a crosslinked structure that enhances abrasion resistance and elastic recovery, suitable for use as a polishing pad.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If conventional urethane resin is used in polishing pads, then the polishing pad can be manufactured with standard materials, but the abrasion resistance and scratch resistance are insufficient
Solution Approach 1:
The patent uses a composite material system consisting of polyrotaxane (axial molecule with cyclic molecules) combined with polyisocyanate compound to create a urethane resin with enhanced crosslinked structure. This composite approach provides superior abrasion resistance and scratch resistance compared to conventional single-material urethane resins, directly resolving the technical contradiction between improving strength and maintaining ease of manufacture.
Solution Approach 2:
The patent changes the molecular structure parameters by introducing polyrotaxane with cyclic molecules that form a crosslinked network structure. This structural parameter change significantly improves abrasion resistance and scratch resistance while maintaining manufacturability through standard polymerization processes with polyisocyanate compounds.
2Reliability
If conventional urethane resin is used, then the manufacturing process is simple, but the elastic recovery and hardness are insufficient for stable high-speed polishing
Solution Approach 1:
The patent employs a composite material system where polyrotaxane with cyclic molecules forms a crosslinked network structure when combined with polyisocyanate compound. This crosslinked structure provides excellent elastic recovery and hardness required for stable high-speed polishing, while the modular nature of the components keeps the manufacturing process manageable.
Solution Approach 2:
The patent utilizes the cyclic (ring-shaped) structure of polyrotaxane molecules that can rotate and flex, providing elastic recovery through the curved molecular architecture. This cyclic structure inherently provides the desired elasticity and hardness without requiring complex multi-component systems.
3Strength
If polyol compound is used to create urethane resin, then the resin can be synthesized with standard chemistry, but no crosslinked structure is formed resulting in poor abrasion resistance
Solution Approach 1:
The patent changes the chemical structure parameter by replacing conventional polyol compounds with polyrotaxane containing cyclic molecules. The cyclic structure of polyrotaxane enables crosslinked network formation when reacted with polyisocyanate compound, creating the desired crosslinked structure for high abrasion resistance while maintaining synthesis feasibility through standard polymerization chemistry.
Solution Approach 2:
The patent creates a composite material system combining polyrotaxane with polyisocyanate compound to achieve crosslinked structure formation. This composite approach provides the necessary crosslinked network for superior abrasion resistance without requiring complex multi-step synthesis procedures, as the crosslinking occurs naturally during the polymerization reaction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resulting urethane resin exhibits improved hardness, elastic recovery, and high abrasion resistance, enabling high polishing rates and low scratching, thus achieving stable and efficient polishing of semiconductor materials.
Implementation Method 1
a urethane resin which is obtained by polymerizing a polymerizable composition, which comprises (A) a polyrotaxane and (B) a polyiso(thio)cyanate compound
Data Source
AI summary
To provide a urethane resin for sliding members which has high abrasion resistance and is considered that crosslinking points are uniformly dispersed so that molecular motion is suitably possible. Particularly, to provide the urethane resin can be advantageously used as a polishing pad.There is provided the urethane resin for polishing is obtained by polymerizing a polymerizable composition comprising (A) a polyrotaxane having a composite molecular structure formed by an axial molecule and a plurality of cyclic molecules clathrating the axial molecule and side chains having an active hydrogen group introduced into at least some of the cyclic molecules and (B) a polyiso(thio)cyanate compound.