Polysilazane Coating Composition for Uniform Gas-Barrier Films

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Solution Overview

Problem

Existing methods for forming inorganic films on organic resin films using polysilazane are prone to defects such as pinholes, which compromise the gas-barrier performance, and are costly due to the need for multiple layers and vacuum conditions.

Innovation Solution

A coating composition comprising a polysilazane compound, a specific surfactant, and an organic solvent that forms a uniform coating without defects, using a combination of polysilazane compound with a repeating structure, a surfactant that does not react with polysilazane, and an organic solvent like ether or ester to enhance solubility and wettability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If CVD method is used to form inorganic film, then gas-barrier performance is improved, but manufacturing cost increases and production efficiency decreases

Engineering Contradiction:
Improvegas-barrier performanceVSAvoidproduction efficiency
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent replaces the mechanical/physical CVD process with a chemical solution-based coating process. The polysilazane solution is applied through conventional coating methods (spin coating, dip coating, spray coating) instead of requiring vacuum CVD equipment, thereby improving production efficiency while maintaining gas-barrier performance through the chemical conversion of polysilazane to inorganic film.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the processing parameters from vacuum conditions to atmospheric conditions, and from high-temperature CVD to solution-based coating followed by low-temperature curing. This allows conventional coating equipment to be used instead of expensive CVD equipment, improving productivity while achieving the desired film properties.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If CVD method is used to form inorganic film, then gas-barrier performance is improved, but manufacturing cost increases

Engineering Contradiction:
Improvegas-barrier performanceVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent replaces the expensive CVD manufacturing system with conventional solution-based coating equipment. The polysilazane solution can be applied using simple, low-cost coating methods available in standard manufacturing facilities, eliminating the need for expensive vacuum CVD equipment while achieving comparable gas-barrier performance.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent uses a solution-based approach where the polysilazane is delivered as a disposable solution that can be easily applied and discarded, rather than requiring expensive, complex CVD equipment. This reduces manufacturing costs by using simple, consumable materials instead of expensive capital equipment.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Manufacturing precision

If polysilazane solution is applied multiple times to improve gas-barrier performance, then film uniformity is improved, but production time increases

Engineering Contradiction:
Improvefilm uniformityVSAvoidproduction time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent optimizes the concentration and formulation of the polysilazane solution to achieve uniform film formation in a single application. By adjusting solution parameters (concentration, viscosity, additives), the patent enables high-quality films to be formed without requiring multiple coating cycles, thereby reducing production time while maintaining film uniformity.

Inventive Principle:
Principle #35Parameter changes

4Manufacturing precision

If surface-modifying treatment is applied to improve wettability, then film uniformity is improved, but manufacturing complexity increases

Engineering Contradiction:
Improvefilm uniformityVSAvoidmanufacturing complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent uses the polysilazane solution itself as an intermediary that provides both coating and surface modification functions. The solution is formulated to inherently improve wettability and adhesion without requiring separate surface treatment steps, thereby simplifying the manufacturing process while achieving uniform film formation.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent combines the coating process and surface modification process into a single step. The polysilazane solution is formulated to simultaneously provide coating coverage and improve surface wettability/adhesion, eliminating the need for separate surface treatment steps and reducing manufacturing complexity.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves a highly uniform coating with improved gas-barrier performance and reduced pinholes, offering better durability and cost-effectiveness by avoiding gelation and precipitation issues.

Implementation Method 1

an organic solvent component (C)

Methodology Applied
Scientific EffectSolvation: Solvation

Implementation Method 2

a surfactant component (B)

Methodology Applied
Scientific EffectSurfactant: Surfactant

Data Source

PatentEP4650408A1Coating composition
Publication Date: 2025.11.19 SHIN ETSU CHEMICAL CO LTD
  • EP4650408A1 patent drawingFigure 1
  • EP4650408A1 patent drawingFigure 2
  • EP4650408A1 patent drawing

AI summary

The present invention is a coating composition including the following (A), (B), and (C). (A) A polysilazane compound having a repeating structure represented by the following formula (1). In the formula, R1 independently represents a hydrogen atom or a group selected from an aliphatic hydrocarbon group having 1 to 6 carbon atoms, an aromatic hydrocarbon group having 6 to 12 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms. "n" represents an integer of 2 to 20,000. (B) A surfactant represented by the following formula (2). In the formula, R2 independently represents a hydrogen atom or a group selected from an aliphatic hydrocarbon group having 1 to 6 carbon atoms, an ω-hydroxyalkyl group having 1 to 12 carbon atoms, and an ω-alkoxyalkyl group having 2 to 12 carbon atoms. (C) An organic solvent. This can provide a coating composition that can uniformly form an inorganic film with a polysilazane on an organic resin film without defects such as pinholes.