Photo-curing Polysiloxane Composition for Protective Film
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional positive photosensitive materials containing polysiloxane struggle to form patterns with good fineness due to hydrophobicity, leading to pattern reflow issues after post-baking when developed with dilute alkali solutions.
Innovation Solution
A photo-curing polysiloxane composition comprising polysiloxane, o-naphthoquinonediazidesulfonate compound, and solvent, with specific molecular weight distribution and oligomer content, is used to create a protective film that maintains pattern shape without reflow after post-baking.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If conventional positive photosensitive material containing polysiloxane is used, then the material can be developed with dilute alkali solution, but the developed pattern undergoes reflow after post-baking due to hydrophobicity
Solution Approach 1:
The patent changes the molecular weight parameters of the polysiloxane by controlling the ratio of high molecular weight fraction (25-60 wt%) to low molecular weight fraction (<800, 0-10 wt%), thereby adjusting the softening point and developing properties to achieve both good developing performance and pattern stability after post-baking
Solution Approach 2:
The patent creates a composite photosensitive material system combining polysiloxane with specific molecular weight distribution, o-naphthoquinonediazidesulfonate compound, and solvent, where the composite structure achieves both hydrophilicity for good developing and thermal stability for pattern retention
2Stability of the object's composition
If polysiloxane with high molecular weight is used, then the softening point increases and pattern reflow is prevented, but the developing property deteriorates
Solution Approach 1:
The patent optimizes the molecular weight distribution parameters by maintaining 25-60 wt% high molecular weight fraction (10,000-80,000) to ensure adequate softening point and pattern stability, while controlling low molecular weight fraction (<800) at 0-10 wt% to preserve developing properties, achieving a balanced performance
3Ease of operation
If polysiloxane with low molecular weight is used, then the developing property improves, but the softening point decreases causing pattern reflow after post-baking
Solution Approach 1:
The patent adjusts the molecular weight distribution by maintaining 25-60 wt% high molecular weight fraction (10,000-80,000) to ensure the softening point remains above the post-baking temperature, preventing pattern reflow while still achieving adequate developing properties through the controlled presence of low molecular weight fractions (0-10 wt%)
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition ensures a protective film with a proper softening point and good developing properties, preventing pattern deformation and enhancing resolution, even with dilute developer solutions.
Implementation Method 1
a photo-curing polysiloxane composition including a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent
Data Source
AI summary
A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 400 and 100,000 measured by gel permeation chromatography. The amount of oligomers in the polysiloxane having a molecular weight less than 800 is from 0 wt % to 10 wt % based on a total weight of the photo-curing polysiloxane composition. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.