Negative-Type Photosensitive Coloring Composition for Touch Panel Light-Shielding Patterns
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Solution Overview
Problem
Conventional negative-type photosensitive compositions containing silicon oxide compounds face challenges in forming white light-shielding patterns for touch panels, particularly in OGS type touch panels requiring high-temperature treatment, as they may yellow or crack due to heat exposure.
Innovation Solution
A negative-type photosensitive composition incorporating a polysiloxane obtained through co-hydrolyzate condensation of specific alkoxysilane compounds, combined with a white pigment, a polyfunctional acrylic monomer, a photoradical polymerization initiator, and an organic solvent, which enhances chemical and heat resistance while preventing yellowing and cracking.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a negative-type photosensitive composition containing a white pigment is used for high-temperature treatment, then the light-shielding pattern can be formed, but yellowing and cracks occur in the cured film
Solution Approach 1:
The patent changes the chemical composition parameters of the photosensitive composition by incorporating specific polysiloxane compounds with controlled molecular structures and ratios. This modifies the curing characteristics and thermal stability of the film, enabling it to withstand high-temperature treatment without yellowing or cracking while maintaining film integrity.
Solution Approach 2:
The patent creates a composite material system combining polysiloxane compounds with specific resins and additives. This composite structure provides both the necessary light-shielding properties when cured and the thermal stability required to prevent yellowing and cracking during high-temperature processing, resolving the contradiction between formability and heat resistance.
2Ease of manufacture
If conventional negative-type photosensitive composition is used, then the composition can be processed easily, but the cured film shows poor heat resistance and yellows after high-temperature treatment
Solution Approach 1:
The patent modifies the chemical composition parameters by incorporating specific polysiloxane compounds while maintaining compatibility with conventional processing methods. This allows the composition to retain ease of manufacture and processing while dramatically improving heat resistance, preventing yellowing after high-temperature treatment.
3Shape
If a white pigment is added to negative-type photosensitive composition, then white light-shielding pattern can be formed, but the cured film develops cracks after high-temperature treatment
Solution Approach 1:
The patent creates a composite material system where polysiloxane compounds work synergistically with white pigments and other additives. This composite structure maintains the desired white color for light-shielding patterns while providing enhanced crack resistance through the flexible polysiloxane network that accommodates thermal stress during high-temperature treatment.
Solution Approach 2:
The patent adjusts the molecular structure parameters of the polysiloxane compounds and their ratios in the composition. This modifies the physical properties of the cured film, including elasticity and thermal expansion characteristics, enabling it to maintain strength and resist cracking while preserving the white color after high-temperature treatment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of a white cured film with excellent chemical and heat resistance, maintaining integrity even after high-temperature treatment, suitable for OGS type touch panels.
Implementation Method 1
a photoradical polymerization initiator
Implementation Method 2
co-hydrolyzate condensation of an alkoxysilane compound containing a compound represented by the following general formula (1)
Data Source
AI summary
The purpose of the present invention is to provide a negative-type photosensitive coloring composition ideal for forming a white, light-blocking pattern and which not only has excellent chemical resistance, but also has extremely excellent heat resistance and does not yellow or crack even when undergoing high-temperature processing. This negative-type photosensitive coloring composition contains (A) a white pigment, (B) a polysiloxane obtained by co-hydrolyzate condensation of an alkoxysilane compound containing a compound of a specific structure, (C) polyfunctional acrylic monomers, (D) a photoradical polymerization initiator and (E) an organic solvent.