Polysiloxane Naphthoquinone Diazide Resin Composition for Planarization
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Solution Overview
Problem
Existing positive photosensitive compositions for planarization films in liquid crystal display and OLED display devices face challenges in achieving high sensitivity, high residual film thickness ratio, and sufficient storage stability.
Innovation Solution
A positive photosensitive resin composition comprising polysiloxane and a naphthoquinone diazide compound represented by a specific formula, which enhances dissolution inhibition and improves storage stability by interacting with the polysiloxane.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If a material combining acrylic resin and NQD is used for planarization film, then positive photosensitivity is achieved, but thermal resistance is insufficient and the cured product strongly colors upon high-temperature processing
Solution Approach 1:
The patent combines polysiloxane (providing thermal resistance and transparency) with NQD photosensitizer (providing positive photosensitivity) to create a composite material that simultaneously achieves high thermal resistance, high transparency, and adequate photosensitivity for planarization film applications
2Illumination intensity
If polysiloxane is combined with NQD to impart positive photosensitivity, then high transparency is achieved, but sensitivity and residual film thickness ratio are insufficient
Solution Approach 1:
The patent optimizes the molecular structure of polysiloxane by controlling the ratio of specific structural units (formula 2 and formula 3 units) and adjusts the NQD content within specific ranges (0.1-10 wt%) to enhance photosensitivity and residual film thickness ratio while maintaining high transparency
3Productivity
If photosensitizers with esterified hydroxyl groups are used with siloxane materials, then dissolution inhibition ability is improved, but storage stability deteriorates due to unbalanced condensation reactions
Solution Approach 1:
The patent carefully controls the NQD content within 0.1-10 wt% and optimizes the polysiloxane molecular structure (ratio of structural units, molecular weight) to achieve sufficient dissolution inhibition ability while preventing excessive condensation reactions that would compromise storage stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high sensitivity and residual film thickness ratio while maintaining high storage stability, making it suitable for planarization films and other applications.
Implementation Method 1
in the exposed portion, naphthoquinone diazide is converted into indene carboxylic acid, which increases solubility in the developer
Implementation Method 2
in the unexposed portion, sufficient dissolution inhibition effect is performed against the alkaline developer due to the interaction between the photosensitizer and the resin
Data Source
AI summary
A positive photosensitive resin composition may include (a) polysiloxane, and (b) a naphthoquinone diazide compound represented by formula (1):(in the formula (1), R1 is an alkyl group having 1 to 8 carbon atoms; Q is a naphthoquinone diazide sulfonyl group represented by the structure shown below or a hydrogen atom, and at least one of all Qs in the formula (1) is a naphthoquinone diazide sulfonyl group: n is an integer of 0 to 4; m is an integer of 4 to 8; and X is a tetravalent to octavalent organic group having 4 to 30 carbon atoms)(in the above structure, * represents a binding site).