Polysiloxane Composition with Polyhedral Skeleton and Photoacid Generator

The patent changes the chemical parameters of the polysiloxane by replacing epoxy groups with hydrolyzable silyl groups (such as alkoxysilyl groups). This parameter change enables the formation of siloxane crosslinked structures through hydrolysis and condensation reactions, which inherently provide superior heat resistance and light resistance compared to polyether structures from epoxy polymerization.

The patent creates a composite curing system by combining hydrolyzable silyl groups with photoacid generators. This composite approach allows the hydrolyzable silyl groups to undergo hydrolysis and condensation reactions, forming a three-dimensional siloxane crosslinked network that integrates the benefits of both chemical crosslinking and photo-curing mechanisms, achieving excellent heat resistance and light resistance.

The patent extracts and removes the problematic epoxy groups and hydrocarbon spacer structures from the molecular architecture. By replacing them with hydrolyzable silyl groups directly bonded to the polysiloxane skeleton, the invention eliminates the source of poor heat and light resistance while maintaining the essential crosslinking functionality.

Instead of using epoxy groups that form polyether structures upon curing, the patent inverts the approach by using hydrolyzable silyl groups that form siloxane structures. This inversion of the chemical group selection leads to fundamentally different crosslinked network chemistry that provides superior thermal and optical stability.

The patent applies local quality by specifically placing hydrolyzable silyl groups at strategic positions on the polysiloxane skeleton where they can participate in crosslinking reactions. The main polysiloxane chain itself maintains its inherent thermal and optical stability, while the localized silyl groups provide the crosslinking functionality needed for enhanced performance.

The patent incorporates hydrolyzable silyl groups into the polysiloxane structure in advance, before the crosslinking reaction occurs. These pre-positioned groups are ready to undergo hydrolysis and condensation reactions upon exposure to moisture or photoacid catalysts, forming the crosslinked network structure that provides heat and light resistance.