Polysiloxane Polysilazane Film Composition Gas Barrier
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Solution Overview
Problem
Existing film forming compositions using polysilazane often result in films with insufficient gas barrier performance, necessitating a composition and method that enhance gas barrier properties while maintaining thermal stability.
Innovation Solution
A film forming composition comprising a polysiloxane represented by a specific general formula, polysilazane, and an organic solvent, which is coated on a substrate and exposed to light to form a cured film with improved gas barrier and thermal stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If polysilazane is used as film forming material, then gas barrier performance is improved, but film denseness and thermal stability are insufficient
Solution Approach 1:
The patent uses a composite material system comprising polysilazane combined with specific additives (metal organic compound and optional catalyst) to achieve both excellent gas barrier performance and high film denseness with thermal stability. The composite composition allows the components to work synergistically, where polysilazane provides the base gas barrier properties while the metal organic compound enhances denseness and structural stability upon light irradiation.
Solution Approach 2:
The patent changes the chemical composition parameters by introducing metal organic compounds with specific metal elements (Al, Ga, In, Ti, Zr, Hf) and controlling their content ratios. This parameter modification transforms the film properties upon light irradiation, achieving both improved gas barrier performance and enhanced thermal stability through controlled chemical transformation.
2Reliability
If polysilazane film is irradiated with vacuum ultraviolet light in presence of water vapor, then gas barrier film is prepared, but complexity of process conditions increases
Solution Approach 1:
The patent introduces a metal organic compound as an intermediary substance that mediates the reaction process. This intermediary enables the film formation and enhancement process to proceed under simplified conditions compared to direct vacuum ultraviolet irradiation with water vapor, as the metal organic compound facilitates the necessary chemical transformations upon light exposure.
Solution Approach 2:
The patent modifies process parameters by using organic solvent-based coating that can be applied under ambient conditions, then using light irradiation (which can be UV or visible light) instead of requiring vacuum ultraviolet conditions. This parameter change simplifies the overall process while achieving the desired film properties.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves a film with excellent gas barrier performance and high denseness, combining high thermal stability and transparency, suitable for use in display and semiconductor devices.
Implementation Method 1
a gas barrier film by irradiating a coating film formed from polysilazane composition containing a transition metal with vacuum ultraviolet light (wavelength: 230 nm or shorter) in a nitrogen atmosphere
Data Source
AI summary
[Problem] To provide a film forming composition and a method for preparing a film with which it is possible to form a film having excellent gas barrier performance. [Means for Solution] Disclosed is a film forming composition comprising: a polysiloxane that does not include a hydroxyl group or a carboxyl group; a polysilazane; and an organic solvent. Also disclosed is a method for preparing a film comprising: coating a substrate with said composition; and exposing the same to light.