Polyurethane Mounting Pad Uniform Pore Formation
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Solution Overview
Problem
Existing mounting pads for semiconductor and display device polishing have irregularly distributed internal pores, leading to poor cushion properties, non-uniform contact, and inadequate compressibility and compression recovery, which hinder precise polishing.
Innovation Solution
A polyurethane resin composition incorporating C9-15 alkyl benzene sulfonic acid or its salt and DMF solvent is used to form mounting pads with uniformly sized and distributed long and large pores, enhancing compressibility and compression recovery while maintaining low density.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If conventional mounting pads are used with irregularly distributed pores, then manufacturing is simpler, but compressibility and compression recovery rate are poor
Solution Approach 1:
The patent changes the chemical parameters of the polyurethane resin composition by incorporating specific ratios of polyether polyol and polyester polyol (1:4 to 4:1 weight ratio), along with specific catalysts and surfactants, to control the pore formation process and achieve uniform long and large pores with controlled cell structure
Solution Approach 2:
The patent uses a composite polyurethane resin system combining polyether polyol and polyester polyol in specific ratios, along with multiple additives including catalysts, surfactants, and blowing agents, to create a mounting pad with optimized pore structure that achieves both high compressibility and uniform pore distribution
2Reliability
If mounting pads have non-uniform pore size and distribution, then manufacturing is easier, but cushion property and adsorption to subject are insufficient
Solution Approach 1:
The patent optimizes chemical composition parameters including the ratio of polyether to polyester polyol (1:4 to 4:1), catalyst types and concentrations, and surfactant formulations to control phase separation and foam cell formation, resulting in uniform long and large pores that provide consistent cushioning and adsorption properties
Solution Approach 2:
The patent deliberately creates a controlled porous structure with uniform long and large pores through chemical composition control and foaming process optimization, where the pore structure is designed to provide both cushioning effect and adsorption capability for the subject to be polished
3Reliability
If mounting pads have irregular pore distribution, then manufacturing is simpler, but water repellency and uniform contact are insufficient
Solution Approach 1:
The patent modifies chemical composition parameters including adding specific surfactants and controlling the ratio of polyether and polyester polyols to achieve uniform pore distribution and controlled hydrophobicity, ensuring water repellency and uniform contact during polishing
Solution Approach 2:
The patent creates uniform local properties throughout the mounting pad by controlling pore size and distribution uniformly, ensuring that every region of the pad provides consistent water repellency and contact quality with the subject being polished
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resulting mounting pads exhibit improved compressibility and compression recovery rates, ensuring uniform contact and minimizing polishing faults by uniformly dispersing air across the polishing area, thus enhancing polishing precision.
Implementation Method 1
phase separation of the ingredients of the resin composition, for example phase separation of the polyurethane resin, water, and the organic solvent occurs, whereby a polyurethane resin including a plurality of pores formed therein may be obtained
Implementation Method 2
high compressibility and compression recovery rate
Data Source
AI summary
This disclosure relates to a polyurethane resin composition for a mounting pad, including a polyurethane resin, C9-15 alkyl benzene sulfonic acid or a salt thereof, and a DMF solvent, and a polyurethane mounting pad using the same, whereby long and large pores may be uniformly formed thereinside to provide a mounting pad having low hardness, excellent compressibility, and a high compression modulus.