Porous Buffer Layer for OLED Impact Absorption and Tolerance Control

The patent employs a porous buffer layer with controlled pore structures to simultaneously achieve impact absorption and tolerance reduction. The porous structure allows the material to compress under impact while maintaining sufficient mechanical support to reduce gaps between components, thus resolving the contradiction between protection and precision.

The buffer layer is designed as a composite material combining porous structure with specific resin materials to achieve dual functionality: absorbing external impacts through the porous architecture while maintaining dimensional stability to reduce manufacturing tolerances between the rear cover and display panel.

The porous structure of the buffer layer enables it to provide mechanical support for reducing manufacturing tolerances while the same porous architecture absorbs external impacts through compression, thus simultaneously achieving both precision and protection.

The buffer layer's physical parameters (porosity, density, thickness) are optimized to balance its dual functions: maintaining sufficient rigidity to reduce manufacturing tolerance while having enough compliance to absorb external impacts, thereby resolving the contradiction between precision and protection.

The patent merges the thermal management function with the existing buffer layer structure by dispersing thermally conductive fillers within the porous matrix. This integration adds heat dissipation capability without requiring a separate thermal management component, thus improving temperature control while minimizing structural complexity.

The buffer layer is designed as a multi-functional component that simultaneously provides mechanical buffering, tolerance reduction, and thermal management through the incorporation of thermally conductive fillers, thereby achieving multiple functions without proportionally increasing device complexity.