Porous Flow Diffuser for Stable Supercritical Substrate Drying
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Solution Overview
Problem
During the drying process of substrates using supercritical fluids, turbulence forms at the edge of the substrate due to pressure differences, affecting the IPA liquid layer and exposing the top head of the substrate pattern.
Innovation Solution
The apparatus includes a porous member disposed within the processing space to minimize turbulence by reducing the velocity of the processing fluid, using a porous material to stabilize fluid flow and control vortices at the substrate edge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a processing fluid is supplied to the area below a filler during drying processing, then the drying efficiency is improved, but turbulence is formed in the edge region of the substrate causing the top head of the substrate pattern to be exposed
Solution Approach 1:
A porous member is introduced as an intermediary component between the filler and the substrate. This porous member mediates the interaction between the processing fluid and the substrate by controlling fluid flow through its pore structure, thereby preventing direct turbulent contact with the substrate edge while maintaining effective drying
Solution Approach 2:
A porous member made of porous material is positioned between the filler and the substrate. The porous structure allows the processing fluid to pass through in a controlled manner, reducing turbulence and preventing exposure of the substrate pattern top head while maintaining drying efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus efficiently processes substrates by minimizing turbulence, ensuring uniform fluid flow and protecting the substrate pattern during supercritical drying.
Implementation Method 1
a porous member disposed to face the first supply port within the processing space, and having pores
Implementation Method 2
the porous member may be provided in a porous material
Data Source
AI summary
Disclosed is an apparatus for treating a substrate, the apparatus including: a housing providing a processing space; a support unit for supporting a substrate in the processing space; a first supply port for supplying a processing fluid into the processing space; an exhaust port for exhausting the processing fluid within the processing space; and a porous member disposed to face the first supply port within the processing space, and having pores.