Exhaust Gas Scrubber Control Using a Porous Liquid Retention Plate
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in efficiently reducing the amount of dissolving liquid used to eliminate chemical product components from discharged gases, which can affect the environment and human health, as they often require constant spraying and result in excessive liquid consumption.
Innovation Solution
A substrate processing apparatus with a gas processing device featuring a duct with a porous partition plate that retains a dissolving liquid, allowing the discharged gas to contact and dissolve the liquid, and a controller that regulates the flow volume of the dissolving liquid based on concentration detection and operation states, reducing unnecessary liquid use.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a scrubber sprays dissolving liquid to eliminate chemical product components from discharged gas, then the chemical product components are eliminated from the discharged gas, but the amount of dissolving liquid consumed increases
Solution Approach 1:
The patent employs a porous plate as the core component of the gas processing device. The porous structure allows gas to pass through while retaining liquid, creating an efficient contact surface for dissolution. The dissolved components are then removed by suction, enabling the liquid to be reused and significantly reducing consumption compared to conventional spray methods.
Solution Approach 2:
The system automatically regulates liquid supply based on detected concentrations of chemical product components in the discharged gas. The controller adjusts the liquid supply amount dynamically, providing self-service operation that optimizes liquid usage while maintaining effective elimination of harmful components.
2Object-affected harmful factors
If a scrubber sprays dissolving liquid continuously to eliminate chemical product components, then the elimination effectiveness is maintained, but the liquid supply efficiency decreases
Solution Approach 1:
The patent transitions from static continuous spraying to dynamic regulated supply. The liquid supply amount is dynamically adjusted based on real-time detection of chemical product component concentrations and processing unit operation states, thereby improving liquid supply efficiency while maintaining elimination effectiveness.
Solution Approach 2:
The system incorporates concentration detection units that continuously monitor the discharged gas and provide feedback to the controller. This feedback mechanism enables the controller to regulate liquid supply in response to actual contamination levels, optimizing both elimination effectiveness and liquid supply efficiency.
3Reliability
If the liquid supply amount is increased to ensure elimination of chemical product components, then the elimination reliability is improved, but the liquid consumption increases
Solution Approach 1:
The patent changes the operational parameters of the gas processing device by regulating liquid supply amount based on detected concentration levels and processing unit operation states. This parameter adjustment ensures reliable elimination of chemical product components while minimizing liquid consumption through optimized supply levels.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces the amount of used dissolving liquid by optimizing its flow volume according to the concentration of target components in the discharged gas, minimizing environmental impact and liquid consumption.
Implementation Method 1
The partition plate is formed of a porous material that is capable of penetrating the gas and that is capable of retaining the liquid
Implementation Method 2
a dissolving liquid that is capable of dissolving the target component that is included in the gas
Data Source
AI summary
A substrate processing apparatus includes a plurality of processing units, an exhaust route, a gas processing device, and a controller. The exhaust route is provided where a gas that is discharged from the plurality of processing units. The gas processing device eliminates a target component in the gas and includes a duct, a partition plate, a liquid supply unit, and a concentration detection unit. The duct has a flow path. The partition plate partitions the flow path into a plurality of spaces and is formed of a porous material. The liquid supply unit supplies a dissolving liquid to the partition plate. The concentration detection unit detects a concentration of the target component. The controller regulates a flow volume of the dissolving liquid, based on at least one of operation information that indicates operation states of the plurality of processing units and a detection result of the concentration detection unit.