Portable Detector Module for EUV Illumination Alignment
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Solution Overview
Problem
Existing methods for restoring and optimizing the optical performance of EUV illumination systems in EUV apparatuses are time-consuming and costly, requiring extensive measurement of multiple field points for alignment, which can be inefficient and prone to errors.
Innovation Solution
A method involving a compact, portable detector module that measures system measurement variables by subdividing the illumination field into end and intermediate portions, allowing for relative alignment based on measurements at a single field point, thereby reducing measurement time and complexity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If extensive measurement of multiple field points is performed for alignment, then measurement precision is improved, but measurement time and device complexity increase
Solution Approach 1:
The illumination field is divided into end portions and intermediate portions. Measurements are performed at specific locations (end portions) rather than uniformly across the entire field, allowing precise alignment to be achieved with fewer measurement points while maintaining measurement precision.
Solution Approach 2:
A portable detector module is introduced as an intermediary measurement device that can be positioned at different locations within the illumination field. This module enables precise measurements to be taken at selected field points without requiring a fixed, complex measurement system, thereby reducing both measurement time and device complexity.
2Measurement precision
If extensive measurement of multiple field points is performed for alignment, then measurement precision is improved, but device complexity increases
Solution Approach 1:
A portable detector module serves as an intermediary that simplifies the measurement system. Instead of requiring a fixed, complex measurement infrastructure, the portable module can be moved to different field points, reducing device complexity while maintaining the capability for precise multi-point measurements.
Solution Approach 2:
The measurement process uses a standardized portable detector module that can be replicated and moved to different positions. This copying approach allows the same measurement capabilities to be applied at multiple field points without requiring different complex measurement systems for each location.
3Reliability
If mirror modules are replaced and adjusted, then system reliability is improved, but restoration time increases
Solution Approach 1:
The patent performs measurements at specific field points before and after mirror module replacement to establish baseline data. This preliminary action allows for quicker restoration by comparing post-replacement measurements against pre-replacement data, enabling faster identification and correction of alignment issues without requiring extensive trial-and-adjustment procedures.
Solution Approach 2:
The measurement system provides feedback on the alignment state of the illumination system after mirror module replacement. By measuring at selected field points and comparing against reference values, the system enables rapid adjustment and verification, improving restoration efficiency while maintaining reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables rapid and cost-effective restoration of EUV illumination systems by simplifying the measurement process, ensuring accurate alignment with reduced time expenditure and increased mechanical robustness, suitable for EUV apparatuses with scanner operations.
Implementation Method 1
a spatial distribution of measurement light in a pupil plane that is Fourier-transformed in relation to the exit plane for a field point lying in the intermediate portion
Data Source
AI summary
A method for restoring an illumination system installed in an EUV apparatus is provided.