Position Correction Sample for Mass Spectrometry Beam Alignment
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Solution Overview
Problem
The position fluctuations of the sample platform in mass spectrometry devices due to heat and vibrations cause undesirable fluctuations in the ion beam irradiation position, which can affect the precision of micro-region analysis in laser SNMS devices.
Innovation Solution
A position correction sample with a stacked body comprising different materials is used to correct the ion beam irradiation position by forming specific surfaces and recesses, allowing for precise determination and adjustment of the beam's position relative to the sample platform, even during fluctuations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If laser SNMS device is used to analyze micro region of sample, then sensitivity and quantitativeness are improved, but position stability of ion beam irradiation deteriorates due to sample platform fluctuations
Solution Approach 1:
The patent implements a feedback mechanism where the position of the ion beam irradiation is continuously monitored and the deflection electrode voltages are adjusted in real-time to compensate for deviations. The system measures the actual irradiation position and feeds this information back to the control unit, which calculates corrective voltages to maintain the beam at the intended target location on the sample platform.
Solution Approach 2:
The patent replaces mechanical position adjustment mechanisms with an electromagnetic field-based correction system. Instead of physically moving the sample platform or ion beam source to maintain alignment, the system uses deflection electrodes to generate electric fields that steer the ion beam to the correct position, substituting mechanical positioning with electromagnetic control.
2Measurement precision
If sample platform position fluctuates due to heat and vibrations, then analysis precision deteriorates, but adding position correction mechanisms increases device complexity
Solution Approach 1:
The patent makes the deflection electrodes serve multiple functions: they are used during normal operation to steer the ion beam to different regions of interest on the sample, and simultaneously serve as position correction actuators to compensate for platform fluctuations. This multi-functionality avoids adding separate correction mechanisms, thereby limiting the increase in device complexity.
Solution Approach 2:
The system performs self-correction by using its own existing components (deflection electrodes and control unit) to detect and compensate for position errors. The control unit calculates the deviation and applies corrective voltages through the same deflection electrodes used for normal beam steering, allowing the system to self-correct without external intervention or additional dedicated correction hardware.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables high-precision correction of the ion beam position, enhancing the accuracy of mass spectrometry analysis by calculating and compensating for sample platform fluctuations, thereby improving the precision of the analysis.
Implementation Method 1
performs mass spectrometry by sputtering a sample by irradiating an ion beam on the sample surface
Implementation Method 2
producing post-ions by irradiating laser light on the sputtered particles
Data Source
Figure 1
Figure 2
Figure 3A~3B
AI summary
According to an embodiment, a position correction sample (20) is used to correct an irradiation position of an ion beam with respect to a sample platform where an analysis object is disposed in mass spectrometry. The position correction sample (20) comprises a stacked body (LB1). The stacked body includes a first layer (201), a second layer (202), and a third layer (203). The first layer includes a first material. The second layer is provided on the first layer. The second layer includes a second material. The third layer is provided on the second layer. The third layer includes a third material.