Position Detection Apparatus for Semiconductor Wafer Abnormal Points
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Solution Overview
Problem
Existing position detection techniques for semiconductor wafers face challenges with longer processing times and reduced accuracy due to abnormal detection points and noise, leading to potential processing halts and low accuracy outputs.
Innovation Solution
A position detection apparatus comprising a calculation unit, extraction unit, and determination unit that calculates multiple values for shape parameters using selection points, extracts values relevant to a provisional parameter, and determines the best estimate based on detection points, thereby enhancing robustness against measurement errors and noise.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If more detection points are used to obtain more calculated values, then estimation accuracy is improved, but processing time increases
Solution Approach 1:
The patent applies partial action by evaluating only a selected subset of calculated values rather than all possible combinations. The selection unit identifies and evaluates only those calculated values that are likely to be accurate based on predetermined selection criteria, thereby reducing processing time while maintaining estimation accuracy.
Solution Approach 2:
The patent changes the parameter of evaluation by introducing selection criteria that filter calculated values before full evaluation. This parameter change allows the system to focus computational resources on promising candidates, achieving a balance between accuracy and speed.
2Productivity
If fewer detection points are used to reduce processing time, then processing speed is improved, but estimation accuracy decreases
Solution Approach 1:
The patent uses partial action by evaluating only a strategically selected subset of calculated values derived from detection points. This selective evaluation maintains estimation accuracy while significantly reducing processing time compared to evaluating all possible combinations.
Solution Approach 2:
The patent introduces selection criteria as a new parameter that determines which calculated values undergo full evaluation. This parameter change enables faster processing by filtering out unlikely candidates before detailed assessment.
3Measurement precision
If all calculated values are evaluated to ensure high accuracy, then estimation accuracy is improved, but processing complexity increases
Solution Approach 1:
The patent applies partial action by implementing a two-stage process: first selecting promising calculated values based on simple criteria, then evaluating only those selected candidates. This reduces processing complexity while maintaining accuracy by avoiding exhaustive evaluation of all possibilities.
Solution Approach 2:
The patent segments the evaluation process into distinct stages: selection of calculated values based on predetermined criteria, and subsequent detailed evaluation of only selected candidates. This segmentation reduces overall processing complexity by dividing the task into manageable parts.
4Productivity
If abnormal detection points are included in evaluation, then robustness is reduced, but processing completeness is improved
Solution Approach 1:
The patent applies preliminary action by selecting calculated values based on predetermined criteria before full evaluation. This preliminary selection step filters out abnormal detection points that would otherwise compromise robustness, while still maintaining processing completeness by systematically evaluating valid candidates.
Solution Approach 2:
The patent converts the potential harm of abnormal detection points into a benefit by using selection criteria that identify and exclude problematic values. The selection process transforms the challenge of dealing with abnormal points into an opportunity to improve robustness through systematic filtering.
Data Source
AI summary
A hypothesis testing position detection apparatus improves robustness against abnormal detection values, and achieves both high accuracy estimation and high-speed estimation processing. An image processing apparatus extracts, from calculated values for a central position of a plane shape, one of the calculated values nearer a provisional center as a candidate for evaluation (testing) performed using a plurality of detection points.


