Multi-Wavelength Position Sensor for Buried Mark Metrology

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Solution Overview

Problem

Conventional metrology tools using visible light struggle to detect marks buried under opaque material layers due to scattering by substrate surface roughness and topography, leading to inaccurate position determination.

Innovation Solution

A position sensor utilizing an optical system with measurement radiation comprising two selected wavelengths, where the wavelengths are chosen based on a position error swing-curve model to cancel out errors, and an optical transmission filter to normalize amplitude, allowing accurate measurement through opaque layers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If infrared light is used to measure marks under opaque material layers, then the ability to detect buried marks is improved, but scattering by substrate surface roughness and topography increases, leading to measurement errors

Engineering Contradiction:
Improvemark position detection accuracyVSAvoidlight scattering by substrate surface
Core Design Contradiction:
Measurement precisionVSObject-affected harmful factors

Solution Approach 1:

The patent changes the wavelength parameter of measurement radiation from single-wavelength infrared to multi-wavelength radiation. By selecting specific wavelengths from the swing-curve model, the system optimizes penetration through opaque layers while minimizing scattering effects. The swing-curve model identifies wavelength combinations where position errors cancel each other, resolving the contradiction between detection capability and measurement accuracy.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses composite measurement radiation comprising multiple wavelengths instead of single-wavelength radiation. This composite approach combines the advantages of different wavelengths: some wavelengths penetrate opaque material layers effectively while others minimize scattering from substrate surface roughness. The combined effect achieves accurate mark position detection that neither single wavelength could accomplish alone.

Inventive Principle:
Principle #40Composite materials

2Device complexity

If visible light is used for mark detection, then the system is simpler, but marks under opaque material layers cannot be detected

Engineering Contradiction:
Improvemetrology tool simplicityVSAvoidmark detection capability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent extends the wavelength parameter range from visible light to infrared and multi-wavelength radiation. This parameter change enables penetration through opaque material layers that block visible light, restoring mark detection capability while maintaining reasonable system complexity through the use of standard optical components adapted for extended wavelength ranges.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If single wavelength infrared radiation is used, then the system is simpler, but position errors due to substrate topography are not compensated

Engineering Contradiction:
Improvewavelength selection system complexityVSAvoidposition measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent implements a wavelength selection system that chooses specific wavelengths based on the swing-curve model. This model calculates position errors for different wavelengths and identifies combinations where errors cancel. The system complexity is justified by the significant improvement in measurement precision, as the multi-wavelength approach actively compensates for substrate topography effects that would otherwise cause unacceptable errors.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent incorporates a feedback mechanism where the swing-curve model continuously evaluates wavelength selections based on measured or known substrate properties. The system adjusts wavelength choices to optimize error compensation, creating a closed-loop system that adapts to different substrate conditions and maintains high measurement precision across varying topography.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively reduces substrate topography-induced errors by selecting wavelengths that balance position errors, providing precise position information of buried marks, enabling accurate alignment and metrology even under opaque material layers.

Implementation Method 1

an optical system configured to provide measurement radiation to a substrate and to receive at least part of diffracted radiation after the measurement radiation has interacted with a mark provided on the substrate

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

A position sensor utilizing an optical system with measurement radiation comprising two selected wavelengths, where the wavelengths are chosen based on a position error swing-curve model to cancel out errors, and an optical transmission filter to normalize amplitude

Methodology Applied
Scientific EffectOptical filtering: Filter (optical)

Implementation Method 3

the wavelengths are chosen based on a position error swing-curve model to cancel out errors

Methodology Applied
Scientific EffectError cancellation through wavelength selection:

Data Source

PatentUS11333985B2Position sensor
Publication Date: 2022.05.17 ASML NETHERLANDS BV
  • US11333985B2 patent drawing
  • US11333985B2 patent drawing
  • US11333985B2 patent drawing

AI summary

The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.