Positive Resist Composition for High-Resolution Lithography
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current resist compositions face challenges in forming high-resolution resist patterns with excellent shape and lithography properties, particularly as the miniaturization of semiconductor and liquid crystal display elements advances, requiring improved sensitivity and resolution capabilities.
Innovation Solution
A positive resist composition is developed, comprising a base component with acid-dissociable, dissolution-inhibiting groups and an acid-generator component that generates acid upon exposure, allowing for selective solubility changes in an alkali developing solution, enabling the formation of resist patterns with improved shape and lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist compositions are used, then manufacturing process is simple, but manufacturing precision of resist patterns deteriorates
Solution Approach 1:
The patent employs a composite resist composition comprising a base resin containing specific structural units (cyclic carbonate, carboxylic acid, and hydroxyl groups), a multifunctional crosslinking agent, and an acid generator. This composite material system enables high-resolution patterning through synergistic interactions: the cyclic carbonate units provide acid-diffusion pathways, the carboxylic acid groups enable solubility switching, and the crosslinking agent forms a three-dimensional network that prevents unwanted solubility changes in unexposed areas, collectively achieving superior pattern fidelity.
Solution Approach 2:
The patent utilizes parameter changes in the chemical structure of the base resin, specifically incorporating cyclic carbonate structural units that can undergo acid-catalyzed ring-opening reactions. This parameter change (from cyclic to open-chain structure) upon acid exposure fundamentally alters the solubility characteristics of the resin, enabling the exposed regions to become soluble while unexposed regions remain insoluble, thus achieving high-resolution pattern formation.
2Manufacturing precision
If resist composition is optimized for high resolution, then manufacturing precision improves, but ease of manufacture deteriorates
Solution Approach 1:
The patent applies local quality by incorporating specific functional groups (cyclic carbonate, carboxylic acid, hydroxyl) at controlled proportions within the base resin structure. The cyclic carbonate units are present at 10-60 mass% to provide localized acid response zones, while carboxylic acid groups at 5-30 mass% provide localized solubility switching capability. This spatial and compositional distribution of specific functional groups enables high-resolution patterning while maintaining manufacturability through well-defined compositional parameters.
3Manufacturing precision
If acid generator is added to enable solubility change, then manufacturing precision improves, but object-generated harmful factors worsen
Solution Approach 1:
The patent implements preliminary action by incorporating a crosslinking agent that forms a three-dimensional crosslinked network structure within the resist composition before exposure. This pre-formed crosslinked network acts as a barrier that restricts acid diffusion during the exposure and development process. The crosslinked structure is strategically designed to remain intact in unexposed regions, preventing acid from migrating to adjacent unexposed areas, thereby maintaining sharp pattern boundaries and preventing blur.
Solution Approach 2:
The patent uses the crosslinked network structure as an intermediary that mediates between the acid generator and the base resin. The crosslinked network serves as a physical barrier that controls acid diffusion, allowing acid to act on exposed regions while blocking acid from reaching unexposed regions. This intermediary structure effectively decouples the acid generation process from unwanted acid diffusion, enabling high solubility selectivity without the harmful blur effect.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition effectively forms resist patterns with enhanced shape and lithography properties, such as exposure margin and line width roughness, by selectively increasing solubility in exposed areas, thereby improving pattern quality and resolution.
Implementation Method 1
an acid-generator component (B) which generates acid upon exposure
Data Source
AI summary
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the component (A) including a polymeric compound (A1) having an acid dissociable, dissolution inhibiting group in the structure thereof and including a structural unit (a0) having an —SO2— containing cyclic group on the terminal of the side chain, and the component (B) including an acid generator (B1) containing a compound represented by general formula (b1-1) (R0 represents a hydrocarbon group of 1 to 12 carbon atoms which may have a substituent, provided that the carbon atom adjacent to the sulfur atom within the —SO3− group has no fluorine atom bonded thereto, and Z+ represents an organic cation).R0—SO3−Z+ (b1-1)