Positive Resist Composition with Carbodiimide Condensing Agent
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Solution Overview
Problem
Current microfabrication technologies face challenges in achieving high resolution and mask fidelity for semiconductor devices, particularly with the limitations of deep UV and EUV lithography, where further improvements in photoresist film resolution are needed for finer device manufacturing at lower costs.
Innovation Solution
A positive resist composition is developed that includes a compound generating acid in response to actinic light or radiation, a resin component becoming soluble in an alkaline developer, and a carbodiimide or triazine base condensing agent to activate or condense carboxyl groups, enhancing resolution and mask fidelity through controlled acid generation and solubility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photoresist formulations are used with deep UV and EUV lithography, then manufacturing processes can be maintained, but resolution and mask fidelity cannot be sufficiently improved for finer device dimensions
Solution Approach 1:
The patent modifies the chemical composition parameters of the photoresist by incorporating specific carboxyl-containing resin components and acid generators with controlled ratios. This chemical parameter optimization enables higher resolution patterning with KrF and ArF lithography without requiring transition to more expensive EUV equipment, thereby improving manufacturing precision while controlling costs
Solution Approach 2:
The invention creates a composite photoresist system combining carboxyl-containing resin components, acid generators, and base condensing agents in specific proportions. This composite formulation achieves enhanced resolution and mask fidelity by synergistic interaction of components, allowing conventional lithography tools to produce finer patterns without increased manufacturing cost
2Manufacturing precision
If the proportion of carboxyl groups on the resin is increased to improve resolution, then dissolution contrast improves, but excessive carboxyl groups cause adverse effects that degrade performance
Solution Approach 1:
The patent introduces a base condensing agent as an intermediary substance that reacts with excess carboxyl groups on the resin. This mediator converts the harmful excess carboxyl groups into beneficial carboxylate salts, transforming the adverse effect into a positive contribution to dissolution contrast and pattern formation, thereby enabling higher resolution without the negative effects of excessive carboxyl content
Solution Approach 2:
The invention deliberately allows excess carboxyl groups to form on the resin during acid-catalyzed reactions, then uses base condensing agents to convert these potentially harmful groups into carboxylate salts that enhance dissolution contrast. This approach transforms what would normally be a detrimental effect into a beneficial feature that improves resolution and pattern fidelity
3Manufacturing precision
If acid generation is enhanced to improve pattern formation, then resolution improves, but acid diffusion causes loss of mask fidelity
Solution Approach 1:
The patent employs base condensing agents as intermediary substances that locally neutralize acid near the generated sites, preventing acid diffusion to adjacent unexposed regions. This intermediary action maintains sharp pattern boundaries and mask fidelity while still allowing sufficient acid generation for complete deprotection and pattern formation in exposed areas
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high resolution and good mask fidelity, enabling precise microfabrication suitable for advanced semiconductor manufacturing, with improved dissolution contrast and pattern formation capabilities.
Implementation Method 1
a compound which generates an acid in response to actinic light or radiation
Implementation Method 2
a compound for activating or condensing a carboxyl group... specifically a carbodiimide or triazine base condensing agent
Implementation Method 3
a resin component which becomes soluble in an alkaline developer under the action of an acid, the resin component generating resin-solubilizing groups under the action of acid
Data Source
AI summary
A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.