Positive Resist Composition for High-Resolution Lithography
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Solution Overview
Problem
Chemically amplified positive resist compositions with polar groups exhibit poor solubility in organic solvents, leading to difficulties in resist solution preparation and pattern formation, and using non-polar resins results in deteriorated resist patterns.
Innovation Solution
A positive resist composition incorporating a resin component with specific structural units, including a structural unit represented by general formula (a0-1) and (a0-2), which enhances alkali solubility upon acid generation, allowing for improved solubility in organic solvents and precise resist pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resin with polar groups (e.g., hydroxyl group-containing aliphatic polycyclic group) is used to enhance alkali solubility and resolution, then lithography properties are improved, but solubility in organic solvents deteriorates
Solution Approach 1:
The patent changes the chemical structure parameters of the resin by introducing specific structural units with tertiary alkyl groups ( formulas (a0-1) and (a0-2) ) that modify the balance between polarity and solubility. This structural parameter change allows the resin to maintain adequate alkali solubility for good resolution while improving solubility in organic solvents for easier processing
Solution Approach 2:
The patent creates a composite resin structure by combining multiple structural units including tertiary alkyl group-containing units (formulas (a0-1) and (a0-2) ), units with acid-dissociable groups (formula (a1) ), and units with polar groups (formula (a2) ). This composite approach balances the conflicting requirements of alkali solubility and organic solvent solubility
2Ease of manufacture
If a resin without polar groups is used to improve solubility in organic solvents, then ease of manufacture is improved, but resist pattern shape deteriorates
Solution Approach 1:
The patent modifies the resin structure by incorporating specific ratios of structural units (formula (a0-1) and (a0-2) at 10-50 mol% each) that change the physical and chemical parameters to achieve both good solubility and pattern formation
Solution Approach 2:
The patent uses a composite resin system combining tertiary alkyl group-containing units (for solubility), acid-dissociable units (for pattern definition), and polar group units (for pattern shape). This composite material approach resolves the contradiction between solubility and pattern quality
3Manufacturing precision
If chemically amplified resist is used to achieve high resolution and sensitivity, then lithography properties are improved, but solubility control becomes more complex
Solution Approach 1:
The patent changes the solubility parameters by selecting base resins with specific molecular weights (2,000-50,000) and structural compositions that inherently provide good solubility in both organic solvents and alkali solutions, reducing the complexity of solubility control in chemically amplified resists
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent solubility in organic solvents and forms resist patterns with improved shape and stability, addressing the limitations of polar group-containing resins while maintaining high lithography properties.
Implementation Method 1
an acid generator component (B) which generates acid upon exposure
Data Source
AI summary
A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure,the resin component (A) including a structural unit (a0-1) represented by general formula (a0-1) shown below and a structural unit (a0-2) represented by general formula (a0-2) shown below:wherein: R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of Y1 and Y3 independently represents an aliphatic cyclic group; Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, such that a+b=1 to 3; each of c, d and e independently represents an integer of 0 to 3; each of g and h independently represents an integer of 0 to 3; and i represents an integer of 1 to 3.