Positive Resist Composition for Immersion Lithography
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Solution Overview
Problem
Current positive resist compositions for immersion exposure, especially with ArF excimer lasers, face challenges in achieving improved line edge roughness and compatibility with immersion liquids, leading to potential defects and reduced productivity due to interactions with the immersion liquid and limited stability.
Innovation Solution
A positive resist composition is developed, comprising a resin that increases solubility in alkali developers, a compound generating acid upon irradiation, a silicon atom-containing resin with specific groups for enhanced solubility, and a solvent, which forms a film suitable for immersion exposure with improved line edge roughness and compatibility with immersion liquids.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional positive resist compositions are used for immersion exposure with ArF excimer lasers, then exposure can be performed, but line edge roughness deteriorates and pattern profile stability decreases due to interactions with immersion liquid
Solution Approach 1:
The patent modifies the chemical composition parameters of the resist system by introducing a silane coupling agent and specific resin combinations. The silane coupling agent creates a chemical bridge between the resist and immersion liquid, changing the interaction parameters to reduce harmful effects while maintaining exposure performance and pattern stability.
Solution Approach 2:
The patent employs composite material structure by combining multiple resin components (including silane-modified resins) with a silane coupling agent. This composite approach creates a resist system that simultaneously achieves good line edge roughness, pattern profile stability, and compatibility with immersion liquids through synergistic effects of different materials.
2Manufacturing precision
If resist compositions are modified to improve line edge roughness, then pattern quality improves, but compatibility with immersion liquid deteriorates leading to defects
Solution Approach 1:
The silane coupling agent acts as an intermediary substance between the resist composition and immersion liquid. It mediates the interaction by forming a chemical bridge that reduces direct harmful interactions while maintaining the beneficial properties of both the resist and immersion liquid, thereby improving pattern quality without compromising compatibility.
3Productivity
If existing resist materials are used for immersion exposure, then exposure process can be maintained, but productivity decreases due to defects and rework
Solution Approach 1:
The patent incorporates the silane coupling agent and optimized resin composition into the resist formulation before exposure. This preliminary action ensures that the resist is pre-conditioned to be compatible with immersion liquids, preventing defects during exposure and subsequent processing, thereby maintaining high productivity without rework.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves better line edge roughness and pattern profile stability during immersion exposure, reducing defects and maintaining productivity by minimizing interactions with the immersion liquid and ensuring consistent performance.
Implementation Method 1
a compound capable of generating an acid upon irradiation with actinic ray or radiation
Data Source
AI summary
A positive resist composition comprises:(A) a resin capable of increasing its solubility in an alkali developer by action of an acid and not containing a silicon atom;(B) a compound capable of generating an acid upon irradiation with actinic ray or radiation,(C) a silicon atom-containing resin having at least one group selected from groups (X) to (Z),(X) an alkali-soluble group,(Y) a group capable of decomposing by action of an alkali developer to increase the solubility of resin (C) in an alkali developer,(Z) a group capable of decomposing by action of an acid to increase the solubility of resin (C) in an alkali developer; and(D) a solvent.