Positive Resist Composition Solvent Blend for Film Uniformity
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Solution Overview
Problem
Conventional positive resist compositions face issues with solubility and coatability on substrates, particularly when using alcohol-based solvents, leading to poor lithography properties and non-uniform film thickness due to inadequate spreading and precipitation of acrylic resins, which complicates the formation of high-resolution resist patterns.
Innovation Solution
A positive resist composition incorporating a base material component with specific structural units derived from acrylate esters and a lactone-containing cyclic group, dissolved in a solvent blend of alcohol-based and other organic solvents, such as propylene glycol monomethyl ether acetate and cyclohexanone, to enhance solubility and coatability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If alcohol-based organic solvents are used in positive resist compositions, then the resist material can dissolve acrylic resins, but the acrylic resins precipitate over time and exhibit poor coatability
Solution Approach 1:
The patent changes the chemical parameters of the solvent system by introducing a specific alcohol-based organic solvent with controlled molecular structure and properties. This solvent modification enables dissolution of acrylic resin while maintaining composition stability, resolving the contradiction between solubility and long-term stability.
2Manufacturing precision
If conventional positive resist composition is used, then the resist material can be applied, but the film thickness is non-uniform due to poor spreading
Solution Approach 1:
The patent modifies the physical parameters of the resist composition by selecting an alcohol-based organic solvent with appropriate viscosity and surface tension characteristics. This enables the composition to spread uniformly on the substrate during coating while maintaining film thickness uniformity, resolving the contradiction between coatability and manufacturing precision.
3Illumination intensity
If acrylic resins are used in positive resist composition, then the resist can achieve certain transparency, but the resins precipitate and cause streaks and pattern distortions
Solution Approach 1:
The patent changes the chemical parameters of the solvent system to use an alcohol-based organic solvent that maintains acrylic resin in solution. This prevents precipitation and streak formation, thereby preserving both the transparency needed for lithography and the pattern resolution accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves improved solubility and coatability, resulting in uniform film thickness and enhanced resolution of resist patterns, reducing streaks and pattern distortions, thereby improving the overall lithography process.
Implementation Method 1
a base material component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure
Implementation Method 2
dissolved in an organic solvent (S), wherein the organic solvent (S) includes an alcohol-based organic solvent (S1) and at least one organic solvent (S2)
Data Source
AI summary
A positive resist composition including:a base material component (A) which exhibits increased solubility in an alkali developing solution under the action of acid; andan acid generator component (B) which generates acid upon exposure; dissolved in an organic solvent (S),wherein the base material component (A) includes a resin component (A1) having 4 types of specific structural units, andthe organic solvent (S) includes from 60 to 99% by weight of an alcohol-based organic solvent (S1) and from 1 to 40% by weight of at least one organic solvent (S2) selected from the group consisting of propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether and cyclohexanone.