Positive Tone Resist Composition for Ultrafine Pattern Resolution
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current pattern forming methods using chemical amplification struggle with forming ultrafine patterns (less than 40 nm) due to insufficient resolution, especially when using X-rays, electron beams, or extreme ultraviolet rays as exposure sources.
Innovation Solution
A positive tone resist composition comprising an ionic compound and a resin with specific interactive groups that interact with the ionic compound, where the resin's main chain is decomposed by irradiation, enhancing solubility differences between exposed and non-exposed areas, allowing for improved resolution in ultrafine pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If chemical amplification method is used, then sensitivity is improved, but resolution deteriorates due to acid diffusion
Solution Approach 1:
The patent extracts the photoacid generator from the resin structure and makes it a separate component. The resin contains reactive groups that interact with the photoacid generator upon exposure, allowing the acid-generating function to be separated from the resin backbone. This prevents acid diffusion within the resin while maintaining chemical amplification sensitivity.
Solution Approach 2:
The patent introduces an intermediary mechanism where the resin's reactive groups (such as carboxyl groups) interact with the photoacid generator upon exposure. This interaction creates a localized chemical change at the exposure site without requiring acid diffusion, thereby maintaining both sensitivity and resolution.
2Ease of manufacture
If conventional resist composition is used, then manufacturing process is simple, but ultrafine pattern formation capability is insufficient
Solution Approach 1:
The patent changes the chemical parameters of the resist composition by introducing specific reactive groups into the resin structure that can interact with photoacid generators. This chemical modification enables the resin to undergo localized solubility changes upon exposure, achieving ultrafine pattern formation while maintaining a relatively simple manufacturing process.
Solution Approach 2:
The patent creates a composite resist system combining a specially designed resin with reactive groups and a photoacid generator. This composite material structure allows the resin and photoacid generator to work synergistically, achieving both ease of manufacture and superior ultrafine pattern formation capability.
3Productivity
If acid diffusion is allowed, then chemical amplification works, but pattern fidelity to optical image deteriorates
Solution Approach 1:
The patent segments the chemical amplification process into two distinct functions: the photoacid generator provides acid upon exposure, while the resin provides the structural framework with reactive groups. This segmentation confines the chemical reaction to the exposure site, preventing acid diffusion while maintaining amplification efficiency.
Solution Approach 2:
The patent incorporates reactive groups into the resin structure in advance, before exposure. These pre-positioned reactive groups are ready to interact with the photoacid generator upon exposure, enabling immediate localized chemical change without requiring acid diffusion through the resin matrix.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition enables the formation of patterns with extremely excellent resolution, specifically for ultrafine features down to 40 nm or less, by increasing solubility in developers and improving dissolution contrast.
Implementation Method 1
a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound
Implementation Method 2
a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays
Data Source
AI summary
The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.