POSS Block Copolymer Top Coat for Thermal Annealing
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Solution Overview
Problem
The existing method of solvent annealing for block copolymers with a polyhedral oligomeric silsesquioxane (POSS) structure is time-consuming and not suitable for mass production due to low throughput.
Innovation Solution
A method involving the formation of a block copolymer layer with a POSS structure on a substrate, followed by applying a top coat material that changes polarity upon heating and controlling surface energy, and then subjecting it to thermal annealing for phase separation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If solvent annealing is used to achieve phase separation in block copolymer layers with POSS structure, then phase-separated structures can be formed, but the process requires considerable time and has low throughput
Solution Approach 1:
The invention changes the chemical environment parameters by introducing a top coat material with specific polarity characteristics. This top coat material has a polarity that is more similar to the POSS block than to the other block, creating asymmetric interfacial interactions that accelerate phase separation kinetics during thermal annealing, thereby reducing processing time while maintaining reliable phase separation
Solution Approach 2:
The top coat material acts as an intermediary substance that mediates between the block copolymer layers and the environment. By positioning itself at the interface and providing specific polarity interactions, it facilitates faster and more reliable phase separation without requiring extended solvent annealing times, thus improving throughput
2Reliability
If traditional solvent annealing methods are used for block copolymer processing, then phase-separated structures can be achieved, but the method is not suitable for mass production due to time consumption
Solution Approach 1:
The top coat material is applied to the block copolymer layer before thermal annealing, performing a preliminary preparation that sets up favorable interfacial conditions. This preliminary action of introducing the polarity-modifying top coat enables the subsequent thermal annealing to proceed much faster and more efficiently, reducing overall processing time while ensuring reliable phase-separated structure formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly improves throughput and mass producibility by achieving phase-separated structures more efficiently than traditional solvent annealing methods.
Implementation Method 1
a top coat material which undergoes a change in polarity upon heating and controls the surface energy of the layer containing the block copolymer
Implementation Method 2
subjecting the layer containing the block copolymer with the top coat film formed thereon to phase separation by thermal annealing
Implementation Method 3
subjecting the layer containing the block copolymer with the top coat film formed thereon to phase separation by thermal annealing
Data Source
AI summary
A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.