Post-Passivation Capacitor for High-Frequency IC Performance

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Solution Overview

Problem

In integrated circuit applications, capacitors used in mobile devices face challenges in adapting to high frequencies, requiring high Q factors, suitable breakdown voltages, and low leakage currents, which existing technologies struggle to meet effectively.

Innovation Solution

A capacitor is formed partially in a Post-Passivation Interconnect (PPI) structure, utilizing a combination of metal pads, passivation layers, and polymer layers to create a capacitor with improved electrical performance, where the passivation layer acts as a capacitor insulator and the metal pads as electrodes, and the polymer layer is patterned to form openings for the PPI, allowing for efficient high-frequency operation without additional process costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If capacitors are formed using conventional pre-passivation structures, then the manufacturing process is simpler, but the electrical performance (Q factor, breakdown voltage, leakage current) is insufficient for high-frequency applications

Engineering Contradiction:
Improveelectrical performanceVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The capacitor structure transitions from a planar pre-passivation configuration to a three-dimensional post-passivation structure. The bottom electrode extends into a cavity formed after the passivation layer is deposited, creating vertical stacking with the passivation layer serving as the dielectric. This dimensional change enables improved electrical performance while maintaining compatibility with existing CMOS fabrication processes.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The capacitor is divided into distinct functional segments: a bottom electrode formed in a cavity, a passivation layer serving as the dielectric medium, and a top electrode formed subsequently. This segmentation allows each component to be optimized independently for its specific function while maintaining overall electrical performance for high-frequency applications.

Inventive Principle:
Principle #1Segmentation

2Reliability

If additional capacitor fabrication processes are added to improve electrical performance, then the Q factor and breakdown voltage improve, but the manufacturing cost and process complexity increase

Engineering Contradiction:
ImproveQ factorVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The passivation layer, originally designed solely for device protection and isolation, is repurposed to serve dual functions: maintaining device reliability and acting as the dielectric layer for high-performance capacitors. This multi-functionality eliminates the need for separate dielectric deposition processes, reducing manufacturing complexity and cost while achieving the required Q factor and breakdown voltage specifications.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The existing passivation layer structure automatically serves as the capacitor dielectric, eliminating the need for additional dedicated dielectric layers. The cavity formation and electrode patterning processes self-organize to create the capacitor structure using already-present materials, reducing process steps and associated costs while maintaining high electrical performance.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables capacitors with enhanced performance for high-frequency applications, improving electrical performance and maintaining cost-effectiveness by modifying existing lithography masks and using low-k dielectric materials, ensuring high Q factors and suitable breakdown voltages while monitoring capacitance values for process uniformity.

Implementation Method 1

the passivation layer acts as a capacitor insulator

Methodology Applied
Scientific EffectDielectric: Dielectric

Data Source

PatentUS9490203B2Capacitor in post-passivation structures and methods of forming the same
Publication Date: 2016.11.08 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US9490203B2 patent drawing
  • US9490203B2 patent drawing
  • US9490203B2 patent drawing

AI summary

A device includes a metal pad and a passivation layer having a portion overlapping the metal pad. A capacitor includes a bottom capacitor electrode underlying the passivation layer, wherein the bottom capacitor includes the metal pad. The capacitor further includes a top capacitor electrode over the portion of the passivation layer; and a capacitor insulator including the portion of the passivation layer.