Powder Source Transfer Shaft for Thin Film Deposition
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Solution Overview
Problem
Conventional apparatuses for depositing thin films face challenges in quantitatively supplying powder sources, especially for small amounts, leading to inconsistent film thickness and quality due to issues with pressure difference and screw thread methods.
Innovation Solution
An apparatus that uses a transfer shaft with a transfer hole to reciprocate and supply a powder source, allowing precise control of the amount supplied through the internal volume of the hole, accompanied by a pumping unit, gas supply, and heating to prevent conglomeration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If pressure difference method is used to supply powder source, then supply process is simple, but supply amount varies due to moisture, static electricity and remaining powder source
Solution Approach 1:
The patent replaces the pressure difference method with a screw thread mechanical system. A rotary shaft with screw threads rotates to discharge powder source along the threads, providing mechanical control over the supply amount through pitch and rotational speed, thereby improving precision while maintaining operational simplicity
Solution Approach 2:
The patent controls the supply amount by changing parameters of the screw thread system - specifically the pitch of the threads and the rotational speed of the rotary shaft. This allows precise adjustment of powder source supply rate, resolving the issue of variable supply amounts caused by moisture and static electricity
2Manufacturing precision
If screw thread method is used to supply powder source, then supply amount can be controlled by pitch and rotational speed, but fine particles are stuck between screw thread and canister wall
Solution Approach 1:
The patent applies local quality by creating a specific geometric configuration of the screw thread - with optimized thread depth, pitch, and surface finish in the critical discharge region. This local optimization prevents fine particles from adhering to the canister wall while maintaining precise control over the supply amount
Solution Approach 2:
The patent introduces a gas supply system that blows gas into the canister to fluidize and transport fine powder particles. This pneumatic assistance prevents fine particles from being stuck between the screw thread and canister wall, ensuring reliable supply of fine particles while maintaining precision control
3Device complexity
If conventional source supply methods are used, then apparatus structure is simple, but quantitative supply of very small amount of source is difficult
Solution Approach 1:
The patent segments the powder source supply into discrete controlled portions using the screw thread mechanism. Each rotation of the rotary shaft delivers a precise, repeatable amount of powder determined by the thread pitch, enabling quantitative supply of very small amounts while keeping the apparatus structure relatively simple
Solution Approach 2:
The patent incorporates a control system that monitors and adjusts the rotational speed of the rotary shaft to maintain precise supply amounts. This feedback control ensures that very small amounts of powder source can be supplied quantitatively, compensating for variations in material properties or environmental conditions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables stable and precise thin film deposition by quantitatively controlling the powder source supply, ensuring uniform film thickness and high-quality film production, even for small amounts.
Implementation Method 1
a pressure difference is generated between a canister and a chamber by injecting a first gas into the canister, and a powder source is then discharged to the outside of the canister due to the pressure difference
Implementation Method 2
a heating unit for heating the powder source
Implementation Method 3
a thin film is deposited using a source gas evaporated after evaporating a powder source in a solid state
Implementation Method 4
a gas supply unit for supplying a gas for transferring the powder source
Data Source
AI summary
The present invention provides an apparatus for supplying a source and an apparatus for depositing a thin film having the same. The apparatus for supplying a source includes a horizontal channel extending in one direction; pumping and transfer ports extending to pass through the horizontal channel, the pumping and transfer ports being spaced apart from each other; a transfer shaft inserted into the horizontal channel to reciprocate therein; and a storage room connected to one side of the pumping port, the storage room storing and supplying a powder source, wherein the transfer shaft comprises at least one transfer hole for allowing the powder source supplied through the pumping port to be filled therein and to be transferred to an external apparatus through the transfer port. As described above, according to the present invention, a powder source filled in a transfer hole is supplied to an external apparatus by reciprocating a transfer shaft, so that the amount of the powder source supplied to the external apparatus can be quantitatively controlled as much as a fixed quantity corresponding to the internal volume of the transfer hole.