Power Divider for Plasma Source Non-Linearity Compensation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing plasma processing apparatuses face challenges in precisely controlling the power ratio supplied to multiple plasma sources due to non-linearity issues, affecting uniformity and Tool-to-Tool Matching in semiconductor manufacturing.
Innovation Solution
An apparatus with a power divider system that includes first and second variable devices, such as capacitors, to control and compensate for non-linearity in high-frequency power distribution to plasma sources, ensuring linear power supply to antennas, and an impedance matching unit for efficient power distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a variable capacitor is used to control the power ratio supplied to plasma sources, then the power ratio can be adjusted, but the control precision deteriorates due to non-linearity
Solution Approach 1:
The power divider is divided into multiple stages, with each stage containing a variable capacitor. This segmentation allows the total power ratio control to be achieved through multiple smaller adjustment steps, improving overall control precision while maintaining ease of operation.
Solution Approach 2:
Fixed capacitors are introduced as intermediary elements in series with the variable capacitors. These fixed capacitors act as mediators that linearize the overall power ratio control by compensating for the non-linear characteristics of the variable capacitors, thereby improving measurement precision without sacrificing operational ease.
2Manufacturing precision
If multiple plasma sources are used to process large-area substrates, then plasma uniformity can be improved, but the system complexity increases
Solution Approach 1:
Multiple plasma sources are combined in a single processing chamber with a unified power supply system. The power divider network integrates multiple variable capacitors and fixed capacitors into one cohesive structure, allowing simultaneous control of all plasma sources without requiring separate control systems, thus improving plasma uniformity while managing system complexity.
Solution Approach 2:
The power divider network serves multiple functions simultaneously: it distributes power to multiple plasma sources, provides individual power ratio control for each source, and compensates for non-linearities across the entire system. This multi-functionality improves plasma uniformity without proportionally increasing system complexity.
3Device complexity
If the power ratio is controlled using a single variable capacitor, then the device complexity is low, but the control precision and linearity are poor
Solution Approach 1:
Instead of using a single variable capacitor, the system segments the control function across multiple variable capacitors arranged in a power divider network. Each capacitor handles a portion of the power distribution, and their combined effect provides linearized, precise control over the power ratio to multiple plasma sources while keeping individual component complexity manageable.
Solution Approach 2:
The power divider network uses a composite structure combining variable capacitors and fixed capacitors. This composite configuration leverages the adjustable nature of variable capacitors for control flexibility and the stabilizing effect of fixed capacitors for linearity improvement, achieving high measurement precision without excessive device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise control of power ratios, improving plasma uniformity and facilitating Tool-to-Tool matching, thereby enhancing the efficiency and consistency of semiconductor substrate processing.
Implementation Method 1
a high-frequency power source that provides a high-frequency power
Implementation Method 2
a power divider connected between the high-frequency power source and the plasma source to divide the high-frequency power supplied to the first and second antennas, wherein the power divider includes a first variable device that controls the high-frequency power supplied to the first and second antennas, and a second variable device that compensates for non-linearity of the high-frequency power supplied to the first and second antennas
Implementation Method 3
a plasma source including first and second antennas that generates plasma by using the high-frequency power
Implementation Method 4
a power supply unit that supplies a high-frequency power such that the gas in the chamber is excited into a plasma state
Implementation Method 5
an impedance matching unit connected between the high-frequency power source and the power divider to perform impedance matching
Data Source
AI summary
Disclosed inventions are apparatus for supplying power and an apparatus for treating a substrate including the same. The apparatus for supplying power includes a high-frequency power source that provides a high-frequency power; a plasma source including first and second antennas that generates plasma by using the high-frequency power; and a power divider connected between the high-frequency power source and the plasma source to divide the high-frequency power supplied to the first and second antennas. The power divider includes a first variable device that controls the high-frequency power supplied to the first and second antennas; and a second variable device that compensates for non-linearity of the high-frequency power supplied to the first and second antennas.