Power Feed Structure for Plasma Processing Apparatus
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in achieving uniform in-plane distribution of plasma due to non-uniform distribution of high frequency power across the focus ring, leading to uneven plasma processing.
Innovation Solution
A power feed structure comprising a first connecting member group and a ring-shaped terminal member arranged along the circumferential direction of the focus ring, with additional ring-shaped terminal members and connecting members to stabilize the potential and distribute high frequency power uniformly, suppressing uneven plasma distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single bias potential supply line is used to apply DC voltage to the focus ring, then the structure is simple, but the high frequency power distribution becomes non-uniform leading to uneven plasma distribution
Solution Approach 1:
The single bias potential supply line is segmented into multiple supply lines (first, second, third, and fourth connecting members) arranged along the circumferential direction of the focus ring. Each connecting member is electrically connected to the focus ring at different positions, distributing the DC voltage application points uniformly around the ring. This segmentation allows high frequency power to be distributed more evenly across the focus ring surface, resolving the non-uniform plasma distribution problem while maintaining reasonable structural complexity.
2Manufacturing precision
If multiple connecting members are arranged along the circumferential direction of the focus ring, then plasma distribution uniformity is improved, but the device complexity increases
Solution Approach 1:
Multiple connecting members are arranged along the circumferential direction of the focus ring, with each member electrically connected to the focus ring at different positions. This arrangement creates equipotential regions around the focus ring, ensuring uniform DC voltage distribution. The connecting members are positioned to apply bias potential at multiple points, which stabilizes the potential distribution and enables uniform high frequency power delivery, thereby achieving uniform plasma distribution across the processing area.
Solution Approach 2:
The patent combines multiple functions into the connecting members: they serve as both DC voltage application points and as structures to suppress high frequency current flow. By integrating these functions into a single component system, the patent reduces overall device complexity while achieving the desired plasma uniformity. The connecting members are electrically connected to both the focus ring and the power supply, merging power delivery and plasma control functions.
3Ease of operation
If DC voltage is applied to the focus ring to adjust sheath position, then plasma processing control is achieved, but in-plane plasma uniformity deteriorates
Solution Approach 1:
The DC voltage application is segmented into multiple connecting members arranged circumferentially around the focus ring. This segmentation allows the sheath position to be controlled uniformly across different angular positions of the ring. Each connecting member applies DC voltage at its specific location, and their combined effect creates a uniform sheath position adjustment around the entire focus ring, preventing localized sheath distortions that would cause in-plane plasma non-uniformity.
Solution Approach 2:
Each connecting member is positioned at a specific location along the circumferential direction of the focus ring, applying DC voltage locally at that position. This local application of voltage, when combined with multiple connecting members, ensures that each region of the focus ring receives appropriate bias potential for sheath control. The local quality approach allows precise control of sheath position at each angular position while maintaining overall in-plane uniformity through the distributed arrangement of connecting members.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures stable and uniform distribution of plasma across the focus ring, enhancing the plasma processing uniformity and effectiveness in the plasma processing apparatus.
Implementation Method 1
a first connecting member group including a plurality of first connecting members arranged along a circumferential direction of a focus ring disposed in a processing chamber of a plasma processing apparatus to apply a bias potential to the focus ring
Implementation Method 2
a ring-shaped first terminal member electrically connected to the first connecting members
Data Source
AI summary
A power feed structure includes a first connecting member group and a ring-shaped first terminal member. The first connecting member group includes a plurality of first connecting members arranged along a circumferential direction of a focus ring disposed in a processing chamber of a plasma processing apparatus to apply a bias potential to the focus ring. The ring-shaped first terminal member is electrically connected to the first connecting members.