Precision Dynamic Leveling Mechanism for Pedestal Positioning
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Solution Overview
Problem
Current semiconductor processing systems lack precision in positioning the pedestal within a processing chamber, affecting the uniformity of deposition, etching, and thermal treatment processes due to the absence of automated positional resolution for the pedestal relative to chamber components like the showerhead.
Innovation Solution
A precision dynamic leveling mechanism using a lift assembly with servo motor assemblies, spherical thrust bearing assemblies, and pivot joints, allowing for 3 degrees of freedom movement with positional resolution of less than 0.001″ to ensure uniform and reproducible substrate placement relative to the showerhead.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manual positioning of the pedestal is used, then device complexity is reduced, but manufacturing precision and positional resolution deteriorate
Solution Approach 1:
The patent implements a dynamic leveling mechanism where the pedestal can be automatically adjusted to various tilt angles and positions during processing. The system transitions from a static, fixed pedestal position to a dynamic, adjustable position system controlled by servo motors, enabling real-time optimization of process uniformity without manual intervention.
Solution Approach 2:
The patent replaces manual mechanical positioning with an automated electro-mechanical system. Servo motors and control systems substitute for manual operation, providing precise control of pedestal position and orientation. This substitution enables repeatable, high-precision positioning that cannot be achieved through manual methods alone.
2Reliability
If fixed pedestal position is used, then device complexity is reduced, but process uniformity deteriorates
Solution Approach 1:
The system enables dynamic adjustment of pedestal position and tilt angle during different processing steps. Different tilt angles can be implemented for oxide deposition versus nitride deposition, optimizing process uniformity for each material. The pedestal can be tilted up to 15 degrees from vertical and positioned at various radial locations, allowing tailored process conditions for different materials and process requirements.
Solution Approach 2:
The patent changes the operational parameters of the pedestal system by introducing variable tilt angles and positions. Instead of a fixed vertical pedestal, the system allows continuous adjustment of the pedestal's angular and positional parameters. This enables optimization of process uniformity by matching pedestal orientation to specific process requirements, such as different tilt angles for different deposition materials.
3Manufacturing precision
If automated leveling mechanism is implemented, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The leveling mechanism is divided into separate functional modules: vertical lift mechanism, radial positioning mechanism, and tilt adjustment mechanism. Each module is independently controlled by dedicated servo motors. This segmentation allows each subsystem to be optimized independently and simplifies control, as each motor handles a specific degree of freedom rather than requiring complex coordinated control of a monolithic system.
Solution Approach 2:
The dynamic positioning system serves multiple functions: vertical positioning, radial positioning, and tilt angle adjustment. A single integrated system performs all these functions, eliminating the need for separate adjustment mechanisms for each degree of freedom. This multi-functionality reduces overall system complexity compared to having independent mechanisms for each positioning requirement.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise positioning and orientation of the pedestal, enhancing the uniformity and reproducibility of processes such as chemical vapor deposition by allowing for independent tuning of pedestal tilt and position, thereby improving the quality of deposited layers.
Implementation Method 1
A bolt and a spring are inserted through a pocket in the guide adaptor to connect a bearing to the pedestal assembly carrier. The bearing has an inner race and an outer race. The inner race is forced against the pedestal assembly carrier and the outer race is forced against the guide adaptor.
Data Source
AI summary
Embodiments described herein relate to a precision dynamic leveling mechanism for repeatedly positioning the pedestal within a process. The precision dynamic leveling mechanism includes bearing assemblies. Bearing assemblies having inner races forced against a pedestal assembly carrier and outer races forced against a guide adaptor provide nominal clearance between the inner races and outer races to allow the inner races and the outer races to slide on each other with minimal or no radial motion.